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A plasma-chemical reactor of coupled vacuum-arc and ion-plasma processes for protective coatings formation based on titanium nitride

机译:基于氮化钛的保护涂层耦合真空弧和离子等离子体工艺的等离子体 - 化学反应器

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A plasma-chemical reactor based on the principle of coupling of gas-discharge processes in a VU-1B vacuum installation has been developed. This plasma-chemical reactor combine vacuum-arc evaporation of titanium in a nitrogen-containing plasma and ion-plasma sputtering of copper with the formation of copper vapor. The basis of this method of coatings deposition is the principle of dosing the injection copper vapor into the region of TiN synthesis through a separating diaphragm with a variable metering aperture, which prevents penetration of a titanium vapor into the copper cathode of the magnetron. The synthesis of TiN coatings in copper vapors has been carried out with the formation of nanostructured composite TiN-Cu coatings.
机译:已经开发了一种基于VU-1B真空安装中的气体放电过程耦合原理的等离子体化学反应器。 该等离子体化学反应器将钛的真空弧蒸发与铜蒸气形成的铜的含氮等离子体和离子等离子体溅射相结合。 这种涂层沉积方法的基础是通过具有可变计量孔的分离隔膜将注射铜蒸气分解到锡合成区域的原理,这防止了钛蒸汽渗透到磁控管的铜阴极中。 通过形成纳米结构复合锡-Cu涂料,进行了铜蒸汽中锡涂层的合成。

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