Subatomic Accuracy in EUVL Multilayer Coatings

机译：EUVL多层涂层中的亚原子精度

获取原文

获取原文并翻译 | 示例

页面导航

摘要
著录项
相似文献
相关主题

摘要

Reported is the production of multilayer EUV coatings on 25000 mm~2 large mirror substrates using e-beam based deposition. The accuracy achieved over the full area and the full multilayer stack amounts to an added figure error of 0.02 nm, i.e. in the sub-atomic distance range, thus meeting the future requirements on EUV coating technology.

机译：已报道使用基于电子束的沉积方法在25000 mm〜2大型镜面基板上生产多层EUV涂层。在整个区域和整个多层堆叠上获得的精度总计为0.02 nm，即在亚原子距离范围内的图形误差，从而满足了对EUV涂层技术的未来要求。

著录项

来源
《》|2004年|P.892-896|共5页
会议地点 Santa Clara CA(US)
作者
E. Zoethout; P. Suter; R.W.E. van de Kruijs; A.E. Yakshin; E. Louis; F. Bijkerk; H. Enkisch; S. Muellender;
展开▼
作者单位

FOM Institute for Plasma Physics Rijnhuizen, P.O.Box 1207, Nieuwegein, The Netherlands;

展开▼
会议组织
原文格式 PDF
正文语种 eng
中图分类半导体技术;
关键词
Mo/Si multilayers; EUV lithography;

机译：Mo / Si多层; EUV光刻;

相似文献

外文文献
中文文献
专利

1. EVALUATING THE ACCURACY OF RECONSTRUCTION OF THE ELECTRICAL AND GEOMETRIC PARAMETERS OF MULTILAYER DIELECTRIC COATINGS BY A MULTIFREQUENCY RADIO-WAVE METHOD FOR SLOW SURFACE ELECTROMAGNETIC WAVES [J] . Kazmin A. I., Fedjunin P. A. Measurement techniques . 2020,第8期

机译：评估多层电介质涂层电气和几何参数的精度通过多层电涂层用于慢表面电磁波的多频电涂层方法
2. Adhesion Force Change On Multilayer Euvl Mask Due To Laser Induced Plasma Shock Wave [J] . Tae-Gon Kim, Young-Sam Yoo, Jinho Ahn, Microelectronic Engineering . 2009,第2期

机译：激光诱导的等离子体激波在多层膜掩模上的附着力变化
3. A new approach for actinic defect inspection of EUVL multilayer mask blanks: Standing wave photoemission electron microscopy [J] . U. Neuhaeusler, J. Lin, A. Oelsner, Microelectronic Engineering . 2006,第4a9期

机译：EUVL多层掩模坯料光化缺陷检测的新方法：驻波光发射电子显微镜
4. Multilayers for next generation EUVL at 6.X nm Multilayers for next generation EUVL at 6.X nm Multilayers for next generation EUVL at 6.X nm Multilayers for next generation EUVL at 6.X nm [C] . Yuriy Platonov, Jim Rodriguez, Michael Kriese, EUV and X-ray optics: Synergy between laboratory and space II . 2011

机译：下一代EUVL在6.X nm处的多层 r n t r n r n多层在6.X nm处的EUVL多层 r n t r n r n下一代的多层6.X nm处的EUVL r n t r n r n用于6.X nm处的下一代EUVL的多层
5. Development of Low Stress, Broadband X-ray Optic Multilayer Coatings [D] . Gurgew, Danielle Nicole. 2019

机译：低应力，宽带X射线光学多层涂层的发展
6. Development of a Model of Crack Propagation in Multilayer Hard Coatings under Conditions of Stochastic Force Impact [O] . Alexey Vereschaka, Sergey Grigoriev, Anatoli Chigarev, 2021

机译：随机施工条件下多层硬涂层裂纹繁殖模型
7. Optics and Multilayer Coatings for EUVL Systems [O] . Regina Soufli, Saša Bajt, Russell Hudyma, -1

机译：EUVL系统的光学和多层涂层
8. Multilayer coatings for the EUVL front-end test bed [R] . Vernon, S. P. , Carey, M. J. , Gaines, D. P. , 1995

机译：用于EUVL前端试验台的多层涂层

Subatomic Accuracy in EUVL Multilayer Coatings

摘要

著录项

相似文献

相关主题

期刊订阅