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首页> 外文会议>Metrology, Inspection, and Process Control for Microlithography XX pt.2 >An Investigation of the Removal of 1-Methyl-2-Pyrrolidinone (NMP)
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An Investigation of the Removal of 1-Methyl-2-Pyrrolidinone (NMP)

机译：去除1-甲基-2-吡咯烷酮（NMP）的研究

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摘要

Molecular bases have long been known to be a problem in photolithographic applications using chemically amplified photoresists. Of these molecular bases, ammonia and 1-methyl-2-pyrrolidinone (NMP) have been studied in the most detail since chemical filtration of these contaminants is critical to the success of the photolithographic process. It has been well documented that ammonia is best removed through chemisorptive reactions using acid impregnated adsorbents or strong acid ion exchange resins. However, the mechanism(s) for the removal of NMP has not been investigated to any significant extent. There are several chemical filtration systems available that employ activated carbon, impregnated activated carbon, or ion exchange resins for the removal of NMP. This work investigates the removal of NMP using several different types of adsorbents and rationalizes the adsorption mechanism which is operative in each situation.
机译：长期以来已知分子碱在使用化学放大的光致抗蚀剂的光刻应用中是一个问题。在这些分子碱中，对氨和1-甲基-2-吡咯烷酮（NMP）进行了最详细的研究，因为对这些污染物进行化学过滤对于光刻工艺的成功至关重要。已有文献证明，使用酸浸渍的吸附剂或强酸离子交换树脂，通过化学吸附反应可以最好地去除氨。但是，尚未对NMP去除的机制进行任何重大研究。有几种化学过滤系统可用，它们采用活性炭，浸渍的活性炭或离子交换树脂来去除NMP。这项工作研究了使用几种不同类型的吸附剂对NMP的去除，并合理化了在每种情况下均有效的吸附机理。

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