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MEASUREMENT OF ELASTIC MODULUS AND POISSON'S RATIO OF DIAMOND-LIKE CARBON FILMS

机译:类金刚石薄膜的弹性模量和泊松比的测量

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Elastic modulus and Poisson's ratio of diamond-like carbon (DLC) film was measured by a simple method using DLC bridges which are free from mechanical constraint of substrate. The DLC films were deposited on Si wafer by C_6H_6 r.f. glow discharge at the deposition pressure 1.33 Pa. Because of the high residual compressive stress of the film, the bridge exhibited a sinusoidal displacement by removing the constraint of the substrate. By measuring the amplitude with known bridge length, we could determine the strain of the film required to adhere to the substrate. Combined with independent stress measurement by laser reflection method, this method allows calculation of the biaxial elastic modulus, E/(1 - v), where E is the elastic modulus and v Poisson's ratio of the DLC film. By comparing the biaxial elastic modulus with plane-strain modulus, E/(1 - v~2), measured by nano-indentation, we could further determine the elastic modulus and Poisson's ratio, independently. The elastic modulus, E_1 increased from 87 to 133 GPa as the negative bias voltage increased from 400 to 550 V. Poisson's ratio was estimated to be about 0.20 in this bias voltage range. For the negative bias voltages less than 400 V, however, the present method resulted in negative Poisson's ratio which is physically impossible. The limitation of the present method was also discussed.
机译:类金刚石碳(DLC)薄膜的弹性模量和泊松比通过使用DLC电桥的简单方法测量,该电桥不受基材的机械约束。通过C_6H_6 r.f将DLC膜沉积在Si晶片上。沉积压力为1.33 Pa时,辉光放电。由于薄膜的残余压缩应力较高,因此通过消除基板的约束,该桥呈现出正弦形位移。通过以已知的桥长度测量振幅,我们可以确定粘附到基板所需的薄膜应变。结合通过激光反射法进行的独立应力测量,该方法可以计算双轴弹性模量E /(1-v),其中E是DLC膜的弹性模量和v泊松比。通过比较纳米压痕法测得的双轴弹性模量与平面应变模量E /(1-v〜2),我们可以进一步独立地确定弹性模量和泊松比。随着负偏压从400 V增加到550 V,弹性模量E_1从87 GPa增加到133 GPa。在该偏压范围内,泊松比估计约为0.20。然而,对于小于400V的负偏压,本方法导致负泊松比,这在物理上是不可能的。还讨论了本方法的局限性。

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