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首页> 外文会议>Microelectronics Technology and Devices-SBMicro 2008 >Mechanism Design of Rotational Magnetic Assistance Electrochemical Finishing on Freeform Surface
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Mechanism Design of Rotational Magnetic Assistance Electrochemical Finishing on Freeform Surface

机译：自由曲面旋转磁助电化学精加工的机理设计

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摘要

The current study investigates a new finishing process that uses a rotational magnetic assistance with high efficiency to assist discharging dregs from the electrode gap during the electrochemical finishing on freeform surfaces. The factors affecting the effects of the magnetic assistance in electrochemical finishing are primarily discussed. This study used Taguchi's Method to analyze the combination of optimal parameters. The experimental parameters use four factors and three levels to measure the surface roughness of the magnetic-assistance in the electrochemical finishing. These four factors include current density, magnetic strength, the distance between the two magnets, and rotational speed of the magnets. For the design system, the large current density with magnetic assistance can circumvent the difficulty of dreg discharge, thus reducing the finishing time. Smaller distances between the two magnets or larger magnetic field intensities provide larger magnetic strength, discharge ability and a betterrn finish. A higher rotational speed of the magnets produced a better finish. The average effect of the magnetic assistance was greater than the pulsed current while the machining time did not need to be prolonged by the off time. The magnetic assistance in electrochemical finishing needing a short amount of time to make the freeform-surfaces smooth and bright is recommended.
机译：当前的研究研究了一种新的精加工工艺，该工艺使用高效的旋转磁助剂在自由表面上进行电化学精加工时协助从电极间隙中排出渣reg。首先讨论了影响磁辅助作用在电化学精加工中的因素。本研究使用田口方法分析最优参数的组合。实验参数使用四个因素和三个级别来测量电化学抛光中磁助剂的表面粗糙度。这四个因素包括电流密度，磁强度，两个磁体之间的距离以及磁体的旋转速度。对于设计系统，借助磁辅助的大电流密度可以避免渣reg放电的困难，从而减少精加工时间。两个磁体之间的距离较小或磁场强度较大，可以提供更大的磁强度，放电能力和更好的光洁度。磁体的较高旋转速度产生更好的光洁度。磁辅助的平均效果大于脉冲电流，而无需通过关闭时间来延长加工时间。推荐在电化学精加工中使用磁性辅助剂，该辅助剂需要很短的时间以使自由曲面光滑，明亮。

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