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首页> 外文会议>Microelectronics Technology and Devices-SBMicro 2008 >Fabrication of Multi-point Test Structures Using Focused Ion Beam and Selective Carbon Nanotubes Deposition by Dielectrophoresis
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Fabrication of Multi-point Test Structures Using Focused Ion Beam and Selective Carbon Nanotubes Deposition by Dielectrophoresis

机译：使用聚焦离子束和选择性碳纳米管介电电泳法制备多点测试结构

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摘要

In this work, we present experimental procedures developed for fabrication of multi-point test structures using focused ion beam. The test structure is fabricated in two steps: (i) metal (Au, Pd) electrodes are fabricated by lift-off technique, (ii) nanocontacts are fabricated by ion beam induced deposition of platinum and milling with Ga ion beam. The multi-wall nanotubes (MWNT) are deposited by dielectrophoresis method between metal electrodes. Our test structure allows measurements using 2 and 4 terminals methods.
机译：在这项工作中，我们介绍了为使用聚焦离子束制造多点测试结构而开发的实验程序。该测试结构分两步制造：（i）通过剥离技术制造金属（Au，Pd）电极，（ii）通过离子束诱导的铂沉积并用Ga离子束研磨来制造纳米触点。通过介电电泳法在金属电极之间沉积多壁纳米管（MWNT）。我们的测试结构允许使用2和4端子方法进行测量。

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  • 来源
  • 会议地点 Gramado(BR);Gramado(BR);Gramado(BR);Gramado(BR);Gramado(BR);Gramado(BR)
  • 作者

    M. M. da Silva; A. R. Vaz; C. Verissimo; S. A. Moshkalev; J. W. Swart;

  • 作者单位

    School of Electrical and Computer Engineering, State University of Campinas, (Unicamp), 13083-870, BRAZIL Center for Semiconductor Components (CCS), State University of Campinas (Unicamp), 13083-870, BRAZIL;

    Center for Semiconductor Components (CCS), State University of Campinas (Unicamp), 13083-870, BRAZIL;

    Center for Semiconductor Components (CCS), State University of Campinas (Unicamp), 13083-870, BRAZIL;

    Center for Semiconductor Components (CCS), State University of Campinas (Unicamp), 13083-870, BRAZIL;

    School of Electrical and Computer Engineering, State University of Campinas, (Unicamp), 13083-870, BRAZIL Center for Semiconductor Components (CCS), State University of Campinas (Unicamp), 13083-870, BRAZIL;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 微电子学、集成电路（IC）;
  • 关键词

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