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首页> 外文会议>Microfluidics, BioMEMS, and Medical Microsystems V; Proceedings of SPIE-The International Society for Optical Engineering; vol.6465 >Creation of Embedded Structures in SU-8
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Creation of Embedded Structures in SU-8

机译：在SU-8中创建嵌入式结构

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摘要

Two methods were investigated for the creation of encapsulated micro-fluidic channels and bridges in negative tone SU-8 photoresist. The first uses two exposures at different wavelengths to create the channel sidewalls and micro-channel encapsulation layer; the other method creates both using a single I-line (365 ran) exposure and a grayscale photomask. These methods can define structures with vertical dimensions ranging to hundreds of microns and introduces very little extra processing complexity. For the dual wavelength method, an I-line light source is used to define the channel walls while a non-collimated deep-UV (254 nm) light source provides a large energy dose to the top surface of the SU-8 to produce a membrane over all the channels. Using the dual wavelength method allows SU-8 to be used as the material for the channels and the encapsulation method is self-limiting avoiding the requirement for precise control over the exposure dose. The rate of UV dose and the post-exposure baking parameters are critical to the quality and strength of the micro-channels. Properly designed channels have been successfully developed in lengths up to 1 cm. Alternatively using a grayscale Zn/Al bimetallic photomask and a single I-line exposure, 3D bridge micro-structures were successfully made on SU-8. The use of grayscale masks for both techniques also provides the possibility of shaping the channel. With the ability to create micro-bridges, further research will be performed to investigate how well the single exposure technique can be used to produce micro-channels of various sizes and dimensions.
机译：研究了两种方法来创建负性SU-8光致抗蚀剂中封装的微流体通道和桥。第一种使用不同波长的两次曝光来创建通道侧壁和微通道封装层。另一种方法是使用单个I线（365纳米）曝光和灰度光掩膜来创建。这些方法可以定义垂直尺寸范围为数百微米的结构，并且几乎不会增加额外的处理复杂性。对于双波长方法，使用I线光源定义通道壁，而非准直深紫外（254 nm）光源则为SU-8的顶表面提供大量能量，从而产生SU-8。膜覆盖所有通道。使用双波长方法可以将SU-8用作通道的材料，并且封装方法是自限性的，从而避免了对曝光剂量进行精确控制的要求。紫外线剂量的速率和曝光后的烘烤参数对微通道的质量和强度至关重要。正确设计的通道已成功开发出长达1厘米的长度。或者使用灰度锌/铝双金属光掩模和单线曝光，在SU-8上成功制作了3D桥微结构。两种技术都使用灰度蒙版还可以对通道进行整形。具有创建微桥的能力，将进行进一步的研究以调查单曝光技术可用于生产各种尺寸和尺寸的微通道的能力。

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