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首页> 外文会议>Nanotechnology III; Proceedings of SPIE-The International Society for Optical Engineering; vol.6591 >Fabrication Process of 3D-photonic crystals via UV-Nanoimprint Lithography
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Fabrication Process of 3D-photonic crystals via UV-Nanoimprint Lithography

机译：UV-纳米压印光刻技术制备3D光子晶体

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摘要

In recent years the standard lithography reached its limits due to the diffraction effects encountered and the necessary complexity of compatible masks and projection optics. The restrictions on wavelength, in combination with high process and equipment costs make low cost, simple imprinting techniques competitive with next generation lithography methods. There are several Nanoimprint Lithography (NIL) techniques which can be categorized depending on the process parameters and the imprinting method - either step & repeat or full wafer imprinting. A variety of potential applications has been demonstrated using NIL (e.g. SAW devices, vias and contact layers with dual damascene imprinting process, Bragg structures, patterned media) [1,2]. In this work UV-NIL has been selected for the fabrication process of 3D-photonic crystals. Results with up to three layers will be demonstrated.
机译：近年来，由于遇到的衍射效应以及兼容的掩模和投影光学系统的必要复杂性，标准光刻技术达到了极限。波长的限制，再加上高昂的工艺和设备成本，使得低成本，简单的压印技术可与下一代光刻技术竞争。可以根据工艺参数和压印方法将纳米压印光刻技术（NIL）分为几类，包括分步重复或全晶圆压印。使用NIL已证明了各种潜在的应用（例如具有双金属镶嵌压印工艺的SAW器件，过孔和接触层，布拉格结构，图案化介质）[1,2]。在这项工作中，已选择UV-NIL作为3D光子晶体的制造过程。将演示最多三层的结果。

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