Organic additives for high selectivity oxide CMP based on ceria slurry

机译：基于二氧化铈浆料的高选择性氧化物CMP有机添加剂

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The protection behavior of carboxylate polymer in ceria slurry at shallow trench isolation (STI) CMP was studied using a zeta potentiometry, field emission scanning electron microscopy (FESEM), fourier transform infrared (FTIR) spectroscopy. Carboxylate polymer decreased zeta potential of silicon nitride dramatically due to adsorption to substrate. And so, removal selectivity of oxide to nitride was improved considerably. When carboxylate polymer was added, removal selectivity of oxide to nitride increased to 25:1. Moreover, carboxylate polymer affected the stability of ceria slurry.

机译：使用Zeta电位法，场发射扫描电子显微镜（FESEM），傅立叶变换红外光谱（FTIR）光谱研究了浅沟槽隔离（STI）CMP下二氧化铈浆料中羧酸盐聚合物的保护行为。羧酸盐聚合物由于吸附到基材上而大大降低了氮化硅的ζ电势。因此，大大提高了氧化物对氮化物的去除选择性。当添加羧酸盐聚合物时，氧化物对氮化物的去除选择性增加至25：1。而且，羧酸盐聚合物影响二氧化铈浆料的稳定性。

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来源
《Nineteenth International VLSI Multilevel Interconnection Conference (VMIC) Nov 19-20, 2002 Singapore》|2002年|p.129-132|共4页
会议地点 Singapore(SG);Singapore(SG)
作者
Jae Jeong Kim; Min Cheol Kang; Seung Hwan Cha;
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作者单位

Research Center for Energy Conversion and Storage, School of Chemical Engineering, Seoul National University, Kwanak-gu, Seoul 151 - 742, Korea;

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原文格式 PDF
正文语种 eng
中图分类无线电电子学、电信技术;
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Organic additives for high selectivity oxide CMP based on ceria slurry

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