THE INCREASING VALUE OF METROLOGY AT SUB-130 NM NODES

机译：低于130海里节点处的计量学增值

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Process windows and margins are shrinking, and time to market is becoming more important to achieving the maximum revenue of a product. These factors put pressure on the IC manufacturer to develop and ramp a process faster to a higher yield. Metrology plays an important role in helping the IC manufacturer meet these goals. This paper will describe the value metrology adds from development through mature production and how the proper sampling plans can reduce the amount of WIP that is put at risk.

机译：工艺窗口和利润率正在缩小，上市时间对于实现产品的最大收益变得越来越重要。这些因素给集成电路制造商带来了压力，要求它们加快开发速度并提高产量。计量学在帮助IC制造商实现这些目标方面发挥着重要作用。本文将描述计量技术从开发到成熟生产所增加的价值，以及适当的抽样计划如何减少处于风险中的在制品数量。

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来源
《Nineteenth International VLSI Multilevel Interconnection Conference (VMIC) Nov 19-20, 2002 Singapore》|2002年|p.262-265|共4页
会议地点 Singapore(SG);Singapore(SG)
作者
Terence Boynton; Murali Narasimhan;
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作者单位

KLA-Tencor Corporation, 160 Rio Robles, San Jose, CA 95134, USA;

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会议组织
原文格式 PDF
正文语种 eng
中图分类无线电电子学、电信技术;
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1. Impact of Spacecraft Shielding on Direct Ionization Soft Error Rates for Sub-130 nm Technologies [J] . Pellish J. A.Xapsos M. A.Stauffer C. A.Jordan T. M.Sanders A. B.Ladbury R. L.Oldham T. R.Marshall P. W.Heidel D. F.Rodbell K. P. Nuclear Science, IEEE Transactions on . 2010,第6期

机译：小于130 nm技术的航天器屏蔽对直接电离软错误率的影响
2. Designing leakage tolerant, low power wide-OR dominos for sub-130 nm CMOS technologies [J] . Bhaskar Chatterjee, Manoj Sachdev, Ram Krishnamurthy Microelectronics journal . 2005,第9期

机译：设计低于130 nm CMOS技术的耐泄漏，低功耗宽或多米诺骨牌
3. Critical dimension metrology by through-focus scanning optical microscopy beyond the 22 nm node [J] . Ravikiran Attota, Benjamin Bunday, Victor Vartanian Applied Physics Letters . 2013,第22期

机译：通过聚焦扫描光学显微镜在22 nm节点以外的临界尺寸进行计量
4. CVD TiSiN diffusion barrier integration in sub-130 nm technology nodes [C] . Prindle, C., Brennan, Interconnect Technology Conference, 2002. Proceedings of the IEEE 2002 International . 2002

机译：130纳米以下技术节点中的CVD TiSiN扩散势垒集成
5. Advancing Microbial Metrology to Reveal Microbe-Microbe, Microbe-Host, and Microbe-Environment Interactions [D] . Van Treuren, William. 2020

机译：推进微生物计量揭示微生物微生物，微生物宿主和微生物环境相互作用
6. Environment International. A Journal of Science Technology Health Monitoring and Policy. Vol. 1 number 1/2. Metrology Needs in the Measurement of Environmental Radioactivity [O] . 1979

机译：国际环境。科学技术卫生监测和政策杂志。卷1数字1/2。测量环境放射性的计量学需求
7. Impact of Spacecraft Shielding on Direct Ionization Soft Error Rates for sub-130 nm Technologies [O] . Rodbell Kenneth P., Jordan Michael M., Stauffer Craig A., 2010

机译：低于130 nm技术的航天器屏蔽对直接电离软错误率的影响
8. Impact of Spacecraft Shielding on Direct Ionization Soft Error Rates for sub-130 nm Technologies [R] . Pellish, J. A., Xapsos, M. A., Stauffer, C. A., 2010

机译：航天器屏蔽对130nm以下技术直接电离软错误率的影响

THE INCREASING VALUE OF METROLOGY AT SUB-130 NM NODES

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