Yield analysis of Cross-bridge Kelvin via resistors

机译：跨桥开尔文通过电阻的产量分析

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Cross-bridge type Kelvin via resistors' yield was found to be consistently low when the via overlap with trench was 0.01 μm. The high resistance of such resistors was due to corner rounding of trench that contacts the via bottom. The inevitable corner rounding occurred due to trench corners receiving low UV light during photolithography. This corner rounding also caused trapping of etch residues at via bottom and thereby increased the resistance to above design specifications. To improve the KVM yield, alteration at photomask design level is necessary.

机译：当与沟槽的通孔重叠为0.01μm时，发现跨桥型开尔文过孔电阻器的产量始终较低。这样的电阻器的高电阻是由于与通孔底部接触的沟槽的拐角变圆。由于沟槽角在光刻期间接收到低的紫外线，因此不可避免地发生了角部倒圆。这种圆角倒圆还导致蚀刻残留物滞留在通孔底部，从而提高了对上述设计规格的抵抗力。为了提高KVM产量，有必要在光掩模设计级别进行更改。

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来源
《Nineteenth International VLSI Multilevel Interconnection Conference (VMIC) Nov 19-20, 2002 Singapore》|2002年|p.266-269|共4页
会议地点 Singapore(SG);Singapore(SG)
作者
A. Krishnamoorthy; X. Bu; Q. Guo;
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作者单位

Institute of Microelectronics, 11 Science Park Road, Singapore 117685;

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原文格式 PDF
正文语种 eng
中图分类无线电电子学、电信技术;
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2. Low contact resistivity of barrier height controlled PtHfSi to Si evaluated by cross-bridge Kelvin resistor [J] . Jun Gao, Shun-ichiro Ohmi IEICE Electronics Express . 2011,第20期

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3. Cross-Bridge Kelvin Resistor Structures for Reliable Measurement of Low Contact Resistances and Contact Interface Characterization [J] . Stavitski N., Klootwijk J. H., van Zeijl H. W., IEEE Transactions on Semiconductor Manufacturing . 2009,第1期

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4. Evaluation of ultra-low specific contact resistance extraction by cross-bridge Kelvin resistor structure and transmission line method structure [C] . Tsui Bing-Yue, Tseng Hsuan-Tzu International Conference on Microelectronic Test Structures . 2014

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5. A comparative performance analysis of an analog front end of an electrocardiogram using printed resistors versus standard manufactured resistors. [D] . Darish, Michael S. 2015

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6. Calibration of Germanium Resistors at Low Temperatures (2–20° Kelvin) [O] . G. Cataland, H. H. Plumb 1966

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7. Cross-Bridge Kelvin Resistor Structures for Reliable Measurement of Low Contact Resistances and Contact Interface Characterization [O] . Natalie Stavitski, Student Member, Johan H. Klootwijk, 2014

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8. Design Considerations for the Cross-Bridge Sheet Resistor [R] . Carver, G. P. , Mattis, R. L. , Buehler, M. G. 1982

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Yield analysis of Cross-bridge Kelvin via resistors

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