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Wavelength-Invariant Resist Composed of Bimetallic Layers

机译：双金属层组成的波长不变电阻

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Two layer co-sputtered Bi over In thin films (40 nm/layer) act as a microfabrication resist with many potential applications. Their physical, chemical and optical characteristics change after laser exposures that produce a rapid thermal anneal in selected areas. Unlike organic photoresists, Bi/In is a bimetallic thermal resist whose sensitivity shows a near wavelength invariance for wavelengths from Near IR to UV. The laser-induced patterns are developed by an etch that selectively removes unexposed areas and retains converted ones. The optical density (OD) of 40 nm thick Bi/In films on quartz substrates, for example, changes from 3.3 OD to 0.37 OD in the annealed area. This has enabled the creation of direct-write photomasks for standard photoresist exposures. In this paper, the composition, morphology, and nanostructure of the resist before and after laser processing were studied in order to determine the mechanism of the laser-induced material conversion. AFM, XRD, and TEM show that the as-deposited films are polycrystalline, continuous, but with a rough, island morphology. Furnace anneals in air above the eutectic temperature (150-250℃, 3 hours) result in the formation of the tetragonal phase BiIn with a small degree of oxidation. The island morphology is maintained but there is evidence of melting and recrystallization. Transparency is much lower than after laser annealing. RBS and NRA depth profile analysis show that Bi/In films exposed to laser annealing in air contain a large fraction of oxygen and suggest that the converted film may be a BiIn_(0.6)O_6/Bi_(0.3)InO_6bilayer.
机译：In薄膜上两层共溅射Bi薄膜（40 nm /层）可作为微加工抗蚀剂，具有许多潜在应用。它们的物理，化学和光学特性在激光暴露后发生变化，从而在选定区域产生快速的热退火。与有机光致抗蚀剂不同，Bi / In是一种双金属热抗蚀剂，对于从近IR到UV的波长，其灵敏度显示出近乎波长不变的特性。激光诱导的图案是通过有选择地去除未曝光区域并保留转换后的区域的蚀刻形成的。例如，石英基板上40 nm厚的Bi / In膜的光密度（OD）在退火区域从3.3 OD变为0.37 OD。这使得能够创建用于标准光刻胶曝光的直接写入光掩模。本文研究了激光加工前后抗蚀剂的组成，形貌和纳米结构，以确定激光诱导材料转化的机理。 AFM，XRD和TEM表明，沉积后的薄膜是多晶的，连续的，但具有粗糙的岛状形态。在高于共晶温度（150-250℃，3小时）的空气中进行炉退火会形成具有较小氧化度的四方相BiIn。岛形保持不变，但有熔化和重结晶的迹象。透明度远低于激光退火后的透明度。 RBS和NRA深度剖面分析表明，暴露于空气中激光退火的Bi / In膜含有大量的氧，这表明转化膜可能是BiIn_（0.6）O_6 / Bi_（0.3）InO_6双层。

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