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Design of illumination system for ArF excimer laser step-and-scanner

机译：ArF准分子激光步进扫描仪照明系统设计

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摘要

Abstract: In a lithography tool, illumination uniformity on the wafer surface is important, because the variance of intensity on the wafer surface makes it hard to control the line width of the pattern. An illuminating system for ArF excimer laser step- and-scanner has been designed and assessed. The system showed good illumination homogeneity in both of the reticle and pupil plane with a reasonable light transmission efficiency. The goal of design is the uniformity within plus or minus 1% on the reticle surface. In order to achieve the goal, the output beam of the excimer laser with nonuniform intensity distribution was re-shaped by using a beam expander which is composed of 4 cylindrical lenses, and the zoom lens varying the beam size according to the aperture of fly's eye lens integrator. The fly's eye lens integrator consists of 208 lenses and generates the good homogeneity in the reticle plane. The effective light sources, i.e. the images made by fly's eye lenses, were projected onto the entrance pupil of the combined system of projection and relay lenses. The exposure field at reticle plane is 104 $MUL 20 mm$+2$/, and is defined as the image of reticle blinder by the 1x relay optics. The designed illumination system showed good performance by simulation and it will be adequate to the ArF excimer laser step-and-scanner under development. !6
机译：摘要：在光刻工具中，晶片表面上的照明均匀性很重要，因为晶片表面上强度的变化使得很难控制图案的线宽。已经设计和评估了用于ArF准分子激光步进扫描仪的照明系统。该系统在标线和瞳孔平面上均显示出良好的照明均匀性，并具有合理的透光率。设计的目标是掩模版表面上的正负1％内的均匀性。为了达到这个目的，通过使用由4个柱面透镜组成的扩束器，对变焦距透镜根据蝇眼的光圈大小进行改变，来对强度分布不均匀的准分子激光器的输出光束进行整形。镜头积分器。蝇眼透镜积分器由208个透镜组成，并在标线片平面内产生良好的均匀性。有效光源，即由蝇眼透镜拍摄的图像，被投影到投影透镜和中继透镜组合系统的入射光瞳上。掩模版平面上的曝光场为104 $ MUL 20 mm $ + 2 $ /，由1x中继光学器件定义为掩模版盲板的图像。设计的照明系统通过仿真显示出良好的性能，将足以满足正在开发的ArF准分子激光步进扫描仪的需求。 ！6

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