Abstract: Plasma etch studies as well as optical spectroscopic and contact angle measurements have been performed on a number of blanket spin-on organic antireflective coatings prior to and after being subjected to various UV photostabilization processes. Included in this study are antireflective coatings, which are in current use for 248 nm and 365 nm applications as well as others that are being evaluated for 193 nm lithography. The exposure dose, temperature, and blanketing atmosphere during the curing process were varied. The objective of these studies is to generate fundamental information regarding the impact of different UV photostabilization processes upon the structural, optical, and surface properties as well as upon the etch characteristics of these films. !7
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