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首页> 外文会议>Optical Microlithography XI >Feasibility studies of operating KrF lasers at ultranarrow spectral bandwidths for 0.18-um line widths
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Feasibility studies of operating KrF lasers at ultranarrow spectral bandwidths for 0.18-um line widths

机译：在0.18um线宽的超窄谱带宽下操作KrF激光器的可行性研究

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Abstract: The use of higher NA lenses and higher throughput of the next generation 248 nm microlithography systems sets tight requirements on the spectral properties of the laser as well as its power output and dose stability. We demonstrate that such scaling of spectral widths, power and repetition rates is possible by revisiting some of the dynamics of evolution of laser spectrum and stability of laser discharge. In the following, we present results of several optical configurations, that result in spectral widths between 1.0 and 2.0 pm (95% integrated linewidth). The optical configurations are derivatives of Cymer's standard Littrow grating and prism expander configuration. Thereby, the other parameters (beam size, coherence, etc.) are not impacted. Simultaneously, we provide results of scaling a laser to 2 kHz with a dose stability of less than plus or minus 0.5% over a 16 ms window. The resulting laser is now capable of meeting the technical requirements of the next generation microlithography scanners. !7
机译：摘要：使用更高的NA透镜和更高的下一代248 nm微光刻系统的通量对激光器的光谱特性以及其功率输出和剂量稳定性提出了严格的要求。我们证明，通过重新审视一些激光光谱的演化动力学和激光放电的稳定性，可以对光谱宽度，功率和重复率进行这样的缩放。在下面，我们介绍几种光学配置的结果，这些结果导致光谱宽度在1.0到2.0 pm之间（积分线宽为95％）。光学配置是Cymer标准Littrow光栅和棱镜扩展器配置的衍生产品。因此，其他参数（光束大小，相干性等）不受影响。同时，我们提供了在16毫秒窗口内将激光器缩放至2 kHz且剂量稳定性小于或小于0.5％的结果。所产生的激光现在能够满足下一代微光刻扫描仪的技术要求。 ！7

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