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New projection optical system for beyond 150-nm patterning with KrF and ArF sources

机译:使用KrF和ArF光源进行超过150 nm图案化的新型投影光学系统

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Abstract: Two types of new optical system for 150 nm lithography are studied. One is the system with KrF source and high numerical aperture (NA), the other is the system with ArF source. By aerial image simulation, the adequate NA of each projection lens is searched, and the value was 0.68 for KrF source and 0.60 for ArF source. Then the projection lens is fabricated and evaluated. The results are almost same as those of simulation. !2
机译:摘要:研究了两种新型的150 nm光刻光学系统。一个是带有KrF源和高数值孔径(NA)的系统,另一个是带有ArF源的系统。通过航拍图像模拟,搜索每个投影透镜的合适的NA,KrF源的值为0.68,ArF源的值为0.60。然后,制造并评估投影透镜。结果几乎与仿真结果相同。 !2

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