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Dynamic compensation for the lithographic object lens

机译：光刻物镜的动态补偿

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摘要

The nominal design residual aberrations are very small for the lithographic object lens. The RMS wavefront error is in a few milliwaves, and the distortion is in a few nanometers. However, The manufacturing-induced aberrations are inevitable and usually many times larger than the design residual level. One method to reduce the manufacturing-induced aberrations is making a few lens adjustable after the object lens is assembled. Dynamic compensation can correct element metrology and assembly errors effectively, especially for the low order Zernike aberrations. We introduce a dynamic compensation method in this paper. This technique is based on the simulated imaging performance using Zernike sensitivity, which is the simulated results of wavefront aberration change by lens element position change. We can select the potential moving lens by this technique. This method can find the optimum combination of moving lens position where the lithographic object lens imaging performance is improved remarkably.
机译：光刻物镜的标称设计残留像差非常小。 RMS波前误差在几毫波之内，而畸变在几纳米。但是，制造引起的像差是不可避免的，通常比设计残差水平大很多倍。减少制造引起的像差的一种方法是在组装物镜之后使一些透镜可调。动态补偿可以有效地校正元件的度量衡和装配误差，尤其是对于低阶Zernike像差。本文介绍一种动态补偿方法。该技术基于使用Zernike灵敏度的模拟成像性能，这是由镜头元件位置变化引起的波前像差变化的模拟结果。我们可以通过这种技术选择潜在的移动镜头。该方法可以找到移动透镜位置的最佳组合，从而显着改善光刻物镜的成像性能。

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