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Design and fabrication of adjustable X-ray optics using piezoelectric thin films

机译:使用压电薄膜的可调节X射线光学器件的设计和制造

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摘要

Piezoelectric adjustable optics are being developed for high throughput, high resolution, low mass X-ray mirror assemblies. These optics require robust piezoelectric thin films and reproducible lithographic patterning on curved glass substrates. This work details the cleaning of Corning Eagle XG® glass substrates for thin shell X-ray mirrors by a three stage acid and solvent cleaning procedure before a 0.02 μm Ti adhesion layer and a 0.1 urn Pt bottom electrode layer was deposited using DC magnetron sputtering. Piezoelectric Pb(Zr_(0.52)Ti_(0.48)_(0.99)Nb_(0.01)O_3 thin films with a thickness of 1.5 μm were then deposited by radio frequency magnetron sputtering in three 0.5 μm layers with intermittent annealing steps in a rapid thermal annealing furnace at 650℃ for 60 seconds. Defects observed in the piezoelectric thin films were linked to residue remaining on the glass after cleaning. 112 piezoelectric cells and 100 μn wide conductive Pt traces were patterned using bilayer photolithography. The photoresist layers were deposited using spin coating at 2000 and 4000 RPM to achieve uniform 1 μm thick layers, resulting in reproducibly resolved features with limiting resolutions of approximately >25 μm. The resulting mirror pieces achieved a 100% yield, with average relative permittivity of 1270, dielectric loss 0.047, coercive field 30 kV/cm and remanent polarization of 20 μC/cm~2. While the defects observed in the films appeared to have not influence on the electrical properties, additional cleaning steps using DI water were proposed to further reduce their presence.
机译:压电可调光学器件正在开发用于高通量,高分辨率,低质量的X射线反射镜组件。这些光学器件需要坚固的压电薄膜和在曲面玻璃基板上可复制的光刻图案。这项工作详细介绍了使用三阶段酸和溶剂清洁程序清洁用于薄壳X射线镜的Corning EagleXG®玻璃基板的过程,然后使用直流磁控溅射沉积0.02μmTi粘附层和0.1 um Pt底部电极层。然后通过射频磁控溅射在三个0.5μm的层中通过间歇性退火步骤在快速热退火中通过射频磁控溅射沉积厚度为1.5μm的压电Pb(Zr_(0.52)Ti_(0.48)_(0.99)Nb_(0.01)O_3薄膜在650℃的温度下加热60秒,清洗后残留在玻璃上的残余物与压电薄膜中的缺陷有关;使用双层光刻技术对112个压电电池和100μn宽的导电Pt迹线进行构图;并通过旋涂法沉积光致抗蚀剂层在2000和4000 RPM下获得均匀的1μm厚度的层,从而产生可重现的特征,极限分辨率约为> 25μm。得到的镜面片达到了100%的屈服率,平均相对介电常数为1270,介电损耗为0.047,矫顽场30 kV / cm和剩余极化强度20μC/ cm〜2。尽管薄膜中观察到的缺陷似乎对电性能没有影响,但产生了额外的透明感提出使用去离子水的宁化步骤以进一步减少它们的存在。

著录项

  • 来源
    《Optics for EUV, x-ray, and gamma-ray astronomy VIII》|2017年|103991K.1-103991K.12|共12页
  • 会议地点 San Diego(US)
  • 作者单位

    Materials Research Institute, Millennium Science Complex. Pennsylvania State University,University Park, PA, 16802, USA;

    Materials Research Institute, Millennium Science Complex. Pennsylvania State University,University Park, PA, 16802, USA,Center for Thin Film Devices, Department of Electrical Engineering, Pennsylvania State University,University Park, PA, 16802, USA;

    Center for Thin Film Devices, Department of Electrical Engineering, Pennsylvania State University,University Park, PA, 16802, USA;

    Department of Astronomy and Astrophysics, Pennsylvania State University, University Park, PA,16802, USA;

    Harvard-Smithsonian Center for Astrophysics, 60 Garden Street, Cambridge, MA, 02138, USA;

    Harvard-Smithsonian Center for Astrophysics, 60 Garden Street, Cambridge, MA, 02138, USA;

    Harvard-Smithsonian Center for Astrophysics, 60 Garden Street, Cambridge, MA, 02138, USA;

    Harvard-Smithsonian Center for Astrophysics, 60 Garden Street, Cambridge, MA, 02138, USA;

    Harvard-Smithsonian Center for Astrophysics, 60 Garden Street, Cambridge, MA, 02138, USA;

    Harvard-Smithsonian Center for Astrophysics, 60 Garden Street, Cambridge, MA, 02138, USA;

    Center for Thin Film Devices, Department of Electrical Engineering, Pennsylvania State University,University Park, PA, 16802, USA;

    Materials Research Institute, Millennium Science Complex. Pennsylvania State University,University Park, PA, 16802, USA;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Piezoelectric thin film; adjustable optics; X-ray mirror; PZT; Lynx;

    机译:压电薄膜;可调光学元件; X射线镜; PZT; x;

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