Department of Aerospace Engineering, Indian Institute of Science, Bengaluru-560012, India;
Department of Aerospace Engineering, Indian Institute of Science, Bengaluru-560012, India,Department of Metallurgical and Materials Engineering, NIT Surathkal 575025, India;
Department of Aerospace Engineering, Indian Institute of Science, Bengaluru-560012, India;
Department of Metallurgical and Materials Engineering, NIT Surathkal 575025, India;
Centre for Nano Science and Engineering, Indian Institute of Science, Bengaluru 560012, India;
Graphene; silicon; defects; electronic band structure; density of states; bandgap; optical conductivity;
机译:硼改性石墨烯纳米结构的研究;石墨烯纳米粒子的光电特性和石墨烯纳米片的传输特性
机译:石墨烯的太赫兹光电性能:衬底诱导的等离子体特性的影响
机译:GaAs衬底上用于光电应用的CVD石墨烯的接触特性
机译:石墨烯对硅衬底的光电性质:石墨烯中缺陷的影响
机译:支持石墨烯界面的基本研究:石墨烯场效应晶体管(FET)中缺陷密度和理想石墨烯 - 硅肖丝狄克二极管
机译:氧化石墨烯比例对氧化石墨烯包覆的硅基板上细胞粘附和生长行为的影响
机译:石墨烯的太赫兹光电性质:衬底对等离子体特性的影响