A Correlation Between the Kinetics and Thermodynamics for the Photo-Electrochemical Etching of N-Si in 2MHF-Ethanolic Solutions

机译：2MHF-乙醇溶液中N-Si的光电化学刻蚀的动力学和热力学之间的相关性

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In the photo-electrochemical etching of Si/HF system, the kinetics was investigated extensively in the literature. Usually, any problem belonging to science and engineering was solved using both thermodynamic and kinetic aspects. In this work, the kinetic of the system was correlated with the thermodynamics, by introducing the energy bend diagrams, to comprehend the etching trend. The effect of ethanol added into the system was concerned. The results from photo-electrochemical kinetics (i.e., i-v diagram) are in agreement with that expected from thermodynamics via estimation of activation energy estimation from the corresponding energy band diagrams. The SEM morphology reconfirmed the result inferred from both aspects.

机译：在Si / HF系统的光电化学蚀刻中，动力学已被广泛研究。通常，使用热力学和动力学方法都可以解决任何属于科学和工程的问题。在这项工作中，通过引入能量弯曲图，系统的动力学与热力学相关，以了解蚀刻趋势。关注乙醇添加到系统中的效果。光电电化学动力学的结果（即，i-v图）与热力学所期望的结果一致，该结果是根据相应能带图的活化能估算来估算的。 SEM形态再次确认了从两个方面推断的结果。

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来源
《Pits and pores 4: New materials and applications - in memory of ulrich gosele》|2010年|p.39-43|共5页
会议地点 Las Vegas NV(US);Las Vegas NV(US)
作者
Wern-Dare Jheng; Jing-Chie Lin;
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Department of Mechanical Engineering, National Chin-Yi University of Technology, Taichung 411, Taiwan;

Department of Mechanical Engineering National Central University No.300, Jhongda Rd., Jhongli City, Taoyuan County 320, Taiwan;

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6. A Correlation Between the Kinetics and Thermodynamics for the Photo-Electrochemical Etching of N-Si in 2MHF-Ethanolic Solutions [C] . Wern-Dare Jheng, Jing-Chie Lin ECS Meeting . 2011

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A Correlation Between the Kinetics and Thermodynamics for the Photo-Electrochemical Etching of N-Si in 2MHF-Ethanolic Solutions

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