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On the determination of the time-dependent degradation laws in deep submicron SOI MOSFETs

机译:关于深亚微米SOI MOSFET随时间变化的退化规律的确定

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摘要

Hot-carrier effects are thoroughly investigated in deep submicron N-and P-channel SOI MOSFET. A saturation phenomenon relative to the initial power time-dependent law can be observed for long stress time. In this paper, various lifetime prediction methods in the saturation regime are proposed and compared. The gate length dependence of the maximal drain biases in order to obtain a 10 years lietime is also addressed with these various extrapolation techniques.
机译:在深亚微米N沟道和P沟道SOI MOSFET中彻底研究了热载流子效应。较长的应力时间可以观察到相对于初始功率时间相关定律的饱和现象。本文提出并比较了饱和状态下的各种寿命预测方法。为了获得10年的停顿时间,最大漏极偏置的栅极长度依赖性也通过这些各种外推技术得到了解决。

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