【24h】

Study on chemical behavior of energetic deuterium implanted into tungsten carbide

机译:高能氘注入碳化钨的化学行为研究

获取原文
获取原文并翻译 | 示例

摘要

Retention behavior and chemical behavior of deuterium implanted into WC were studied by means of XPS and TDS. It was found from the TDS spectra that the deuterium desorptions consisted of four stages for WC, where the two peaks at lower temperature were attributed to the desorption of deuterium retained in the interstitial sites of WC lattice, the third one to that trapped by carbon vacancy which induced by chemical sputtering of the energetic deuterium, and the fourth one was originated from the desorption of deuterium bound to carbon as forming C-D bond. In the present study, it can be said that the deuterium retention was much less than those in other carbon materials such as graphite and SiC.
机译:利用XPS和TDS研究了注入WC的氘的保留行为和化学行为。从TDS光谱中发现,氘的解吸由WC的四个阶段组成,其中较低的两个峰归因于保留在WC晶格间隙位置中的氘的解吸,第三个是由于碳空位所捕获的它是由高能氘化学溅射引起的,而第四个是由于结合到碳上的氘脱附形成CD键而引起的。在本研究中,可以说氘的保留量远小于其他碳材料(如石墨和SiC)中的氘保留量。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号