A Trial of p-ZnO Preparation by R.F. Sputtering

机译：R.F.制备p-ZnO的尝试。溅镀

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In this paper, a comparative study was conducted between the ZnO films prepared on glass substrate by r.f. sputtering with Nitrogen and Oxygen as the working gases and the films prepared on the same glass substrate with Argon and Oxygen as the working gases.

机译：本文通过r.f.法对玻璃基板上制备的ZnO膜进行了比较研究。以氮气和氧气作为工作气体进行溅射，并在同一玻璃基板上以氩气和氧气作为工作气体制备薄膜。

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来源
《Proceedings of the Summer School on Semiconductor Nanostructures and Optoelectronic Devices》|2005年|P.18-20|共3页
会议地点 Beijing(CN)
作者
Pang Xiaofeng; Yu Lei; Zhang Zhiyong;
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作者单位

Beihang University, Beijing 100083, China;

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会议组织
原文格式 PDF
正文语种 eng
中图分类半导体技术;
关键词
p-ZnO; r.f.sputtring; nitrogen;

机译：p-ZnO; r.f。沉淀;氮;

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专利

1. RESISTENCIA A LA CORROSIóN A ALTA TEMPERATURA EN PELíCULAS DELGADAS DE Bi x Ti y O z PRODUCIDAS POR SPUTTERING R.F. ( HIGH-TEMPERATURE CORROSION RESISTANCE OF BIxTIyOz THIN DEPOSITED BY R.F. SPUTTERING ) [J] . Jhon Jairo Olaya Florez, Oscar Piamba, Johanan Parra Revista Latinoamericana de Metalurgia y Materiales . 2016,第1期

机译：溅射法制得的Bi x Ti y O z薄膜的高温耐蚀性能（通过射频溅射沉积的BixTIyOz薄膜的耐高温腐蚀性能）
2. Preparation of a heteroepitaxial LaxSryMnzO3/BiFeO3 bilayer by r.f. magnetron sputtering with various oxygen gas flow ratios [J] . H. Naganuma, T. Ichinose, H. A. Begum, AIP Advances . 2014,第8期

机译：通过r.f.制备异质外延LaxSryMnzO3 / BiFeO3双层。各种氧气流量比的磁控溅射
3. Preparation and Characterization of R.F. Magnetron Sputtered Mo:ZnO Thin Films [J] . K.Srinivasarao, G.Srinivasarao, K. V.Madhuri, Indian Journal of Materials Science . 2013,第2期

机译：R.F.的制备和表征磁控溅射Mo：ZnO薄膜
4. A Trial of p-ZnO Preparation by R.F. Sputtering [C] . Pang Xiaofeng, Yu Lei, Zhang Zhiyong, School on Semiconductor Nanostructures and Optoelectronic Devices . 2005

机译：r.f的p-zno准备试验。溅射
5. Characterization of epitaxial cadmium telluride and lead telluride layers grown by R.F. magnetron sputtering [D] . Mukherjee, Goutam. 1989

机译：射频生长的外延碲化镉和碲化铅层的表征磁控溅射
6. Catalytic growth of ZnO nanostructures by r.f. magnetron sputtering [O] . María Arroyo-Hernández, Raquel Álvaro, Sheila Serrano, 2011

机译：r.f.催化生长ZnO纳米结构磁控溅射
7. Preparation of monoclinic 0.9(BiFeO3)–0.1(BiCoO3) epitaxial films on orthorhombic YAlO3 (100) substrates by r.f. magnetron sputtering [O] . T. Ichinose, H. Naganuma, K. Mukaiyama, 2015

机译：用R.F的正交yalo3（100）底谱系上单斜醚0.9（BIFEO3）-0.1（BICO3）外延膜的制备。磁控溅射
8. Determination of PSEUDOGAP State Density and Carrier Mobility in R.F. Sputtered Amorphous Silicon. Quarterly Technical Progress Report, July 1, 1979-September 30, 1979 [R] . Paul, W. 1979

机译：R.F.中psEUDOGap状态密度和载流子迁移率的测定溅射非晶硅。 1979年7月1日至1979年9月30日的季度技术进步报告

A Trial of p-ZnO Preparation by R.F. Sputtering

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