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APPLICATION OF ELECTRIC CURRENT IN GROWING SILICON SINGLE CRYSTALS

机译:电流在硅单晶生长中的应用

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摘要

The application of electric field to silicon semiconductors materials is used to modify the melt convection mode in Czochralski growth configuration and to control the structures at the surface of crystal. The nonlinear phenomena, the decrease of the stabilized applied voltage in closed circuit with the increase of the electric current, are observed experimentally. The mathematical model to predict the temperature of silicon crystal and the electric field in closed circuit is developed to study the electric current-induced Joule heating phenomena in silicon semiconductor materials. In this work, numerical simulations have been performed using Newton method and implicit Euler time integration. It has been demonstrated that numerical analyses are qualitative agreement with experimental results and it is possible to reproduce the nonlinear behavior in the application of electric current to silicon materials.
机译:在硅半导体材料上施加电场可用于改变切克劳斯基生长构型中的熔体对流模式,并控制晶体表面的结构。实验观察到了非线性现象,即闭环中稳定施加电压随电流的增加而减小。建立了预测硅晶体温度和闭路电场的数学模型,以研究电流引起的硅半导体材料的焦耳热现象。在这项工作中,已经使用牛顿法和隐式欧拉时间积分进行了数值模拟。已经证明,数值分析与实验结果在质量上是一致的,并且有可能在将电流施加到硅材料上时再现非线性行为。

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