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Development of immersed diffraction grating for the TROPOMI-SWIR spectrometer

机译：TROPOMI-SWIR光谱仪浸没式衍射光栅的开发

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摘要

We have developed a novel diffraction grating based on lithographical techniques and anisotropic etching in silicon. The grating is designed for the short-wave-infrared channel of the TROPOMI imaging spectrometer that will be launched on ESA's Sentinel 5 Precursor mission to monitor trace gases in the earth atmosphere. Stringent requirements on both the imaging properties and the quality of the spectra translate to a high-tech grating. In our design the dispersion and resolution is increased with a factor 3.4 with respect to conventional gratings by using the grating in immersion, such that diffraction takes place inside the silicon grating material. By lithographic patterning and anisotropic etching of the mono-crystalline silicon we precisely control line spacing and blaze angle. The grating has a line spacing of 2.5 um and is operated in sixth order. We show that an efficiency of 60% is reached on a 50 x 60 mm2 grating surface. We compare our test results with numerical calculations for grating efficiency for both polarizations and find good agreement.
机译：我们已经开发了一种基于光刻技术和硅各向异性刻蚀的新型衍射光栅。光栅是为TROPOMI成像光谱仪的短波红外通道设计的，该通道将在ESA的Sentinel 5 Precursor任务中启动，以监视地球大气中的痕量气体。对成像特性和光谱质量的严格要求转化为高科技光栅。在我们的设计中，通过在浸入中使用光栅，相对于常规光栅，色散和分辨率提高了3.4倍，从而使衍射发生在硅光栅材料内部。通过单晶硅的光刻图案化和各向异性蚀刻，我们可以精确地控制行距和闪耀角。光栅的行距为2.5 um，以六阶操作。我们显示在50 x 60 mm2的光栅表面上达到60％的效率。我们将测试结果与数值计算进行了比较，以计算两种偏振的光栅效率，并找到了很好的一致性。

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