Low-nonlinearity and low-loss silicon slot waveguides with ALD-grown thin films

机译：具有ALD生长薄膜的低非线性和低损耗硅缝隙波导

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We demonstrate low-loss silicon slot waveguides filled with single and dual atomic layer deposited oxide layers.Propagation losses less than 5 dB/cm and 8 dB/cm are achieved for the waveguides with single (Al2O3) and double(Al2O3-TiO2) layers, respectivel

机译：我们演示了填充有单原子层和双原子层沉积氧化物层的低损耗硅缝隙波导，单层（Al2O3）和双层（Al2O3-TiO2）的波导的传输损耗分别小于5 dB / cm和8 dB / cm ，各自

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来源
《Silicon photonics and photonic integrated circuits III.》|2012年|P.1M.1-1M.7|共7页
会议地点 Brussels(BE)
作者
L. Karvonen; A. Säynätjoki; A. Tervonen;
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作者单位

Aalto Univ. (Finland);

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原文格式 PDF
正文语种 eng
中图分类半导体光电器件;半导体光电器件;
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4. Low-nonlinearity and low-loss silicon slot waveguides with ALD-grown thin films [C] . L. Karvonen, A. S?yn?tjoki, A. Tervonen Conference on silicon photonics and photonic integrated circuits III . 2012

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Low-nonlinearity and low-loss silicon slot waveguides with ALD-grown thin films

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