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首页> 外文会议>Society of Vacuum Coaters 46th Annual Technical Conference; May 3-8, 2003; San Francisco, California USA >Performance of High-Precision Knife Blades Treated by Plasma Nitriding and PVD Coating
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Performance of High-Precision Knife Blades Treated by Plasma Nitriding and PVD Coating

机译：等离子渗氮和PVD涂层处理的高精度刀刃性能

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High precision knife blades with included angle between 12 and 14 degrees have been plasma nitrided and subsequently coated with two types nanoscale multilayer plasma vapor deposition (PVD) coatings such as CrN/NbN and C/Cr. The plasma nitriding has been performed using low pressures of ～ 10~(-3)mbar at bias voltages varied between -500V to -1000V at temperatures of 430℃. The coatings have been deposited by the combined steered cathodic arc/unbalanced magnetron sputtering technique (ABS). Both plasma nitriding and ABS coating deposition have been integrated in one process carried out in one coaler. OES analysis revealed that the density of the N_2~+and N~+ ions can be increased threefold by increasing the bias voltage during nitriding from -500V to -1200V. The ion saturation current density, evaluated by flat electrostatic probe measurements, was found to increase from 0.06 to 0.2 mAcm~(-2) , when the bias voltage was increased from -500V to -1200V. Secondary neutral mass spectroscopy (SNMS) depth profiling revealed that the nitrogen concentration in the surface zone was 20 atomic percent corresponding to formation of γ~I phase followed by a typical diffusion profile in the depth of the material. The cutting performance of the duplex treated blades has been tested using specialized testing equipment, cutting an abrasive elastic material under a constant normal load. The initial cutting power of the plasma nitrided and PVD coated blades has been improved by a factor of 3, whereas the lifetime of the treated blades has been prolonged almost by 10 times.
机译：包括12至14度夹角的高精度刀片已被等离子氮化，随后用两种类型的纳米级多层等离子气相沉积（PVD）涂层（例如CrN / NbN和C / Cr）进行涂覆。等离子体氮化是在430℃的温度下，在〜500〜-1000V的偏压范围内，使用〜10〜（-3）mbar的低压进行的。涂层是通过组合式导向阴极电弧/不平衡磁控溅射技术（ABS）进行沉积的。等离子体氮化和ABS涂层沉积已集成在一个聚煤器中进行的一个过程中。 OES分析表明，通过将氮化过程中的偏压从-500V增加到-1200V，可以使N_2〜+和N〜+离子的密度增加三倍。当偏置电压从-500V增加到-1200V时，通过平板静电探针测量评估的离子饱和电流密度从0.06增加到0.2 mAcm〜（-2）。二次中性质谱（SNMS）深度剖析显示，表面区域中的氮浓度为20原子百分比，对应于γ〜I相的形成，随后是材料深度中的典型扩散曲线。已经使用专门的测试设备测试了经过双工处理的刀片的切割性能，该工具在恒定的法向载荷下切割了磨料弹性材料。等离子氮化和PVD涂层刀片的初始切割能力提高了3倍，而处理过的刀片的寿命几乎延长了10倍。

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