High Rate and High Target Use Sputter Metallizer Cathode

机译：高速率和高目标用途的溅射金属化阴极

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摘要

A new type of magnetron sputtering cathode has been developed that offers exceptional target use and deposition rates when sputtering pure metals, alloys and ferromagnetic materials.

机译：已经开发出一种新型的磁控溅射阴极，当溅射纯金属，合金和铁磁材料时，可提供出色的靶材使用和沉积速率。

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来源
《Society of Vacuum Coaters Annual Technical Conference; 20040424-29; Dallas,TX(US)》|2004年|P.741|共1页
会议地点 DallasTX(US)
作者
D. Monaghan; V. Bellido-Gonzalez;
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作者单位

Gencoa Ltd., Liverpool, United Kingdom;

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会议组织
原文格式 PDF
正文语种 eng
中图分类涂料工业;
关键词
magnetron sputtering; magnetic targets; high rate; high target use;

机译：磁控溅射;磁性靶材;高速率;高靶材用途;

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专利

1. Sputtering of dielectric single layers by metallic mode reactive sputtering and conventional reactive sputtering from cylindrical cathodes in a sputter-up configuration [J] . Daniel Rademacher, Tobias Zickenrott, Michael Vergohl Thin Solid Films . 2013,第apra1期

机译：通过金属模式反应性溅射和常规反应性溅射，以溅射配置从圆柱形阴极溅射介电单层
2. Deposition of carbon films onto metal and silicon substrates by filtered cathodic vacuum arc, plasma enhanced CVD and unbalanced magnetron sputtering [J] . I. Ahmad, P. D. Maguire, P. Lemoine Diamond and Related Materials . 2004,第4a8期

机译：通过过滤阴极真空电弧，等离子增强CVD和不平衡磁控溅射将碳膜沉积在金属和硅基底上
3. Preparation of Uniaxial Permalloy Films by Cathodic Sputtering on Glass and Metal Substrates [J] . Flur B. L., Riseman J. Journal of Applied Physics . 1964,第2期

机译：在玻璃和金属基板上阴极溅射制备单轴坡莫合金膜
4. High Rate and High Target Use Sputter Metallizer Cathode [C] . D. Monaghan, V. Bellido-Gonzalez, Society of Vacuum Coaters Society of Vacuum Coaters Annual Technical Conference . 2004

机译：高速和高目标使用溅射金属化器阴极
5. Effects of target temperature in the DC reactive sputter deposition of metal oxides. [D] . Chau, Raymond Yat-Lung. 1996

机译：目标温度对金属氧化物的直流反应溅射沉积的影响。
6. Sputtered Porous Li-Fe-P-O Film Cathodes Prepared by Radio Frequency Sputtering for Li-ion Microbatteries [O] . V. A. Sugiawati, F. Vacandio, C. Perrin-Pellegrino, -1

机译：射频溅射制备锂离子微电池多孔Li-Fe-P-O薄膜阴极
7. Preparation of metal doped SiO₂ films by magnetron sputtering deposition using metal oxide mixture powder target [O] . H. Kawasaki, T. Ohshima, Y. Yagyu, 2018

机译：使用金属氧化物混合物粉末靶通过磁控溅射沉积制备金属掺杂SiO <亚> 2 膜
8. Investigation of Energy Distribution of Products of Cathode Sputtering of Metals by Mercury Ions [R] . Ben'yaminovich, M. B., Veksler, V. I. 1964

机译：用汞离子研究金属阴极溅射产物的能量分布

High Rate and High Target Use Sputter Metallizer Cathode

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