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首页> 外文会议>Society of Vacuum Coaters Annual Technical Conference; 20040424-29; Dallas,TX(US) >Using Calibration Tests for Trimming Target Uniformity Masks
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Using Calibration Tests for Trimming Target Uniformity Masks

机译：使用校准测试修剪目标均匀性掩模

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摘要

An important problem in optical multi-layer thin film deposition is the trimming of target uniformity masks to reach the desired film uniformity distribution over the substrate. Calibration tests, that is, special multi-layer optical designs, are a widely used tool to determine deposition rates for materials deposited at different substrate points. These rates are then used to identify the trim pattern for the target mask. Obviously the calibration tests do not give an absolute determination of deposition rates for deposited materials with accuracy better than random error in the layer thickness, thereby limiting the precision of the target trim. However, it is not necessary to know the absolute values of deposition rates at different substrate points to determine the mask trim. It is necessary to know the relative values of the deposition rates at chosen substrate points to trim the mask. In this paper, it is shown that using calibration tests, along with special fit algorithms for measured optical spectra, provide the relative deposition rates for deposited materials at different substrate points with precision significantly exceeding the random error in layer thicknesses of deposited film structure. The proposed method is an excellent tool for trimming target uniformity masks.
机译：光学多层薄膜沉积中的重要问题是修整目标均匀性掩模以在基板上达到所需的膜均匀性分布。校准测试（即特殊的多层光学设计）是一种广泛使用的工具，可以确定在不同基板点沉积的材料的沉积速率。然后，将这些速率用于标识目标蒙版的修整图案。显然，校准测试无法绝对确定沉积材料的沉积速率，其准确性要好于层厚度的随机误差，从而限制了目标修整的精度。然而，不必知道在不同基板点处的沉积速率的绝对值来确定掩模修整。有必要知道在选定的衬底点处的沉积速率的相对值以修整掩模。本文表明，使用校准测试以及用于测量光谱的特殊拟合算法，可以为沉积材料在不同衬底点上的相对沉积速率提供精确度，其精度大大超过沉积膜结构层厚度的随机误差。所提出的方法是修整目标均匀性掩模的极好的工具。

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