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首页> 外文会议>Symposium on Chemical-Mechanical Polishing - Fundamentals and Challenges held April 5-7, 1999,San Francisco, California, U.S.A. >Scanning force microscope studieds of detachment of nanometer adhering particulates
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Scanning force microscope studieds of detachment of nanometer adhering particulates

机译：扫描力显微镜研究纳米附着颗粒的分离

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摘要

We employ salt particles deposited on soda lime glass substrates as a model system for particle detachment in chemcially active environments. The chemical activity is provided by water vapor, and detachment is performed with the tip of a scanning force microscope. The later force required to detach nanometer-scale salt particles is a strong function of particle size and relative humidity. he peak lateral force at detachment divided by the nominal particle area yields an effective interfacial shear strenght. The variation of shear strength with particle size and humidity is described in terms of chemcially assisted crack growth along the salt-glass interface.
机译：我们将沉积在钠钙玻璃基板上的盐颗粒作为模型系统，用于化学活性环境中的颗粒分离。水蒸气提供化学活性，并用扫描力显微镜的尖端进行分离。分离纳米级盐颗粒所需的后一个力是颗粒大小和相对湿度的强函数。分离时的峰值侧向力除以标称颗粒面积可得出有效的界面剪切强度。剪切强度随粒度和湿度的变化是根据沿盐-玻璃界面的化学辅助裂纹扩展来描述的。

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