【24h】

Structural characterization of nc-Sia-SiO_2 superlattices subjected to thermal treatment

机译:热处理的nc-Sia-SiO_2超晶格的结构表征

获取原文
获取原文并翻译 | 示例

摘要

The morphology of nanocrystalline (nc)-Si/amorphous (a)-SiO_2 superlattices (SLs) is studied using Raman spectroscopy in the acoustic and optical phonon ranges, transmission electron microscopy (TEM), and atomic force microscopy (AFM). It is demonstrated that high temperature annealing (up to 1100deg C) and oxidation in O_2/H_2O ambient do not destroy the SL structure, which retains its original periodicity and nc-Si/a-SiO_2 interface abruptness. It is found that oxidation at high temperatures reduces the defect density in nc-Si/a-SiO_2 SLs and induces the lateral coalescence of Si nanocrystals (NCs). The size, shape, packing density, and crystallographic orientation of the Si nanocrystals are studied as a function of the oxidation time.
机译:使用拉曼光谱在声子和光子声子范围,透射电子显微镜(TEM)和原子力显微镜(AFM)中研究了纳米晶体(nc)-Si /非晶(a)-SiO_2超晶格(SLs)的形貌。结果表明,高温退火(高达1100摄氏度)和O_2 / H_2O环境中的氧化不会破坏SL结构,SL结构保持其原始周期性和nc-Si / a-SiO_2界面突变。发现高温氧化降低了nc-Si / a-SiO_2 SLs中的缺陷密度,并诱导了Si纳米晶体(NCs)的横向结合。研究了硅纳米晶体的尺寸,形状,堆积密度和晶体学取向与氧化时间的关系。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号