首页> 外文会议>Symposium on New Applications for Wide-Bandgap Semiconductors; 20030422-20030424; San Francisco,CA; US >Barrier material improvement in AlGaN/GaN microwave transistors under gamma irradiation treatment
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Barrier material improvement in AlGaN/GaN microwave transistors under gamma irradiation treatment

机译:γ辐照处理下AlGaN / GaN微波晶体管的势垒材料改进

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摘要

Effect of small dose gamma-irradiation on electrical characteristics of AlGaN/GaN high electron mobility transistors has been investigated. Decreasing of the leakage current and its noise has been registered after dose of 1x10~6 Rad. As-grown heterostructures used in further for the device fabrication have been examined after the same radiation treatment. The small dose radiation results are explained within a model that takes into account relaxation of elastic strains and structural-impurity ordering occurring in the barrier layer under irradiation.
机译:研究了小剂量伽马射线辐照对AlGaN / GaN高电子迁移率晶体管电学特性的影响。剂量为1x10〜6 Rad时,记录到泄漏电流及其噪声的降低。在相同的辐射处理之后,已经检查了进一步用于器件制造的生长异质结构。小剂量辐射结果在模型中进行了解释,该模型考虑了弹性应变的松弛和在辐射下在阻挡层中发生的结构杂质排序。

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