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Depth-resolved microspectroscopy of porous silicon multilayers

机译:多孔硅多层膜的深度分辨显微光谱

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We have measured micro-potoluminescence (PL) and micro-Raman spectra on the cross section of porous silicon multilayers to sample different layer depths. We find noticelable differences in the spectra of layers with different porosity, as experted from the the quantum confinement of electrons and phonons in silicon nanocrystals with different average sizes. The PL emission band gets stronger, blue shifts, and narrows at the high porosity layers. The average isze can be estimated from the shift. The Raman phonon band at 520 cm~(-1) weakens and broadens asymmetrically to-wards the low energy side. The line shape can be related quantitatively with the average size by the phonon confinement model. To get a good agreement with the model we add a band at around 480 cm~(-1), which has been attributed to amorphous silicon. We also have to leave as free parameters the bulk solicon phonon frequency and its line width, which depend on temperature and stress. We reduced laser power to eliminate heating effects. Then we use the change of frequency with depth to monitor the stress. At the interface with the substrate we find a compressive stress in excess of 10 kbar, which agrees with the reported lattice mismatch. FInally, average sizes are laeger than those estimated from PL.
机译:我们已经在多孔硅多层的横截面上测量了微光致发光(PL)和微拉曼光谱,以采样不同的层深度。我们从具有不同平均尺寸的硅纳米晶体中电子和声子的量子约束中发现,在具有不同孔隙率的层的光谱中发现了显着差异。 PL发射带变得更强,蓝移,并在高孔隙率层变窄。可以从该偏移估计平均isze。 520 cm〜(-1)处的拉曼声子能带朝着低能侧非对称地减弱和扩展。线形可以通过声子限制模型与平均尺寸定量相关。为了与模型取得良好的一致性,我们在480 cm〜(-1)附近添加了一个带,该带归因于非晶硅。我们还必须保留取决于温度和应力的大体积溶胶声子频率及其线宽作为自由参数。我们降低了激光功率,以消除热效应。然后,我们使用随深度变化的频率来监视应力。在与基材的界面处,我们发现压应力超过10 kbar,这与报道的晶格失配相符。最后,平均大小比PL估计的要小。

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