首页> 外文会议>Symposium on Optical Microstructural Characterization of Semiconductors held November 29-30, 1999, Boston, Massachusetts, U.S.A. >Internal spatial modes and local propagation properties in optical waveguides measured using near-field scanning optical microscopy
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Internal spatial modes and local propagation properties in optical waveguides measured using near-field scanning optical microscopy

机译:使用近场扫描光学显微镜测量的光波导的内部空间模式和局部传播特性

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Near-field scanning optical microspcy has been used to measure the internal spatial modes and local properties controlling optical wave propagation in glass/silica buried waveguides. SThe period of he observed standing modes provides a direct measure of the effective index, which combined with the measured transverse modal shape and decay constants, determines the values of all spatial components of the wave vector.
机译:近场扫描光学显微镜已经用于测量内部空间模式和控制玻璃/二氧化硅埋入式波导中光波传播的局部特性。他观察到的站立模式的周期可以直接测量有效指数,再结合测得的横向模态形状和衰减常数确定波矢量的所有空间分量的值。

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