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首页> 外文会议>Symposium on In Situ Process Diagnostics and Intelligent Materials Processing held December 2-5, 1997, Boston, Massachusetts, U.S.A. >Rheed monitoring of rotating samples during large-area homogeneous deposition of oxides
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Rheed monitoring of rotating samples during large-area homogeneous deposition of oxides

机译：大面积均匀沉积氧化物期间对旋转样品进行的Rheed监控

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摘要

We have successfully implemented RHEED monitoring of growth of complex oxides in a reactive evaporation process with substrate rotation and an oxygen environment. A rotating substrate heater is used with a partial enclosure kept at a 10 mTorr oxygen pressure. This heater allows for simultaneous and uniform deposition of multiple 2-inch wafers. The RHEED beam diffracts from samples as they pass through the high-vacuum zone of the heater. A CCD camera is used for RHEED data acquisition and image capture is synchronized to sample position. In order to achieve good quality diffracted images, rotation of the sample is required to be less than 1 degree for the duration of data capture. With our relatively inexpensive setup images can be acquired for sample rotation speeds up to 1500 RPM. We use this RHEED diagnostic system for study of in-situ growth of high-temperature superconducting thin films.
机译：我们已经成功地实施了RHEED监测，在具有基材旋转和氧气环境的反应蒸发过程中，复合氧化物的生长情况。使用旋转基板加热器，其部分外壳的氧气压力保持在10 mTorr。该加热器允许同时均匀地沉积多个2英寸的晶片。当样品通过加热器的高真空区时，RHEED光束会从样品发生衍射。 CCD摄像机用于RHEED数据采集，并且图像捕获与样本位置同步。为了获得高质量的衍射图像，在数据捕获期间，样品的旋转必须小于1度。利用我们相对便宜的设置，可以获取高达1500 RPM的样品旋转速度的图像。我们使用此RHEED诊断系统来研究高温超导薄膜的原位生长。

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