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首页> 外文会议>Symposium on Spatially Resolved Characterization of Local Phenomena in Materials and Nanostructures Dec 2-6, 2002 Boston, Massachusetts, U.S.A. >Confocal optoelectronic holography microscope for materials and structural characterization of MEMS
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Confocal optoelectronic holography microscope for materials and structural characterization of MEMS

机译：共聚焦光电全息显微镜用于MEMS的材料和结构表征

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摘要

In this paper, we describe confocal optoelectronic holography microscopy (COEHM) technique specifically being developed for characterizing the shape of MEMS and microelectronics. This is particularly important because shape is directly related to the functionality, performance, and integrity of the microstructures of interest. A specific feature of COEHM is that it allows characterization of high aspect ratio MEMS and microelectronics. Representative applications demonstrating the capabilities of COEHM are presented. It is shown that measurement resolution is highly dependent on the numerical aperture (NA) of the optical components comprising COEHM and on the quality of image digitization. By utilizing optical components characterized by a magnification factor of 50x and a NA of 0.45, measurement resolution of 25 nm is achieved. The resolution is increased to 8 nm when utilizing optical components characterized by a magnification factor of 100x and a NA of 0.73.
机译：在本文中，我们描述了专为表征MEMS和微电子学形状而开发的共焦光电子全息显微术（COEHM）技术。这一点特别重要，因为形状与目标微结构的功能，性能和完整性直接相关。 COEHM的一个特殊功能是可以表征高纵横比的MEMS和微电子器件。展示了证明COEHM功能的代表性应用。结果表明，测量分辨率高度取决于包含COEHM的光学组件的数值孔径（NA）以及图像数字化的质量。通过使用放大倍数为50倍，NA为0.45的光学组件，可以实现25 nm的测量分辨率。当使用放大倍数为100倍，NA为0.73的光学组件时，分辨率提高到8 nm。

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