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The Inverse Hall-Petch Effect―Fact or Artifact?

机译:逆霍尔效应-是事实还是伪像?

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This paper critically reviews the data in the literature which gives softening―the inverse Hall-Petch effect―at the finest nanoscale grain sizes. The difficulties with obtaining artifact-free samples of nanocrystalline materials will be discussed along with the problems of measurement of the average grain size distribution. Computer simulations which predict the inverse Hall-Petch effect are also noted as well as the models which have been proposed for the effect. It is concluded that while only a few of the experiments which have reported the inverse Hall-Petch effect are free from obvious or possible artifacts, these few along with the predictions of computer simulations suggest it is real. However, it seems that it should only be observed for grain sizes less than about 10 nm.
机译:本文严格地回顾了文献中的数据,这些数据在最细的纳米级晶粒尺寸下提供了软化作用(逆霍尔效应)。将讨论获得无伪影的纳米晶体材料样品的困难以及平均粒度分布的测量问题。还指出了预测逆霍尔效应的计算机模拟,以及针对该效应提出的模型。结论是,虽然只有少数报告逆霍尔效应的实验没有明显的或可能的伪影,但这些很少连同计算机模拟的预测表明它是真实的。但是,似乎只能观察到小于约10 nm的晶粒。

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