The Reaction Front in a Model Photoresist Examined with Neutron and X-ray Reflectivity

机译：用中子和X射线反射率检查的光致抗蚀剂模型中的反应前沿

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1. Direct measurement of the deprotection reaction front w/ nm resolution. 2. Correlate between processing steps: compositional vs density profiles. 3. Reaction front broadens with PEB time / Final Structure is sharp. 4. Development measurably alters the compositional profile. 5. General methodology to provide detailed insight into reaction-diffusion process.

机译：1.直接测量脱保护反应前沿w / nm分辨率。 2.在加工步骤之间关联：成分与密度曲线。 3.反应前沿随PEB时间加宽/最终结构清晰。 4.发展显着地改变了成分分布。 5.提供深入了解反应扩散过程的一般方法。

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《Tenth Meeting of the Symposium on Polymers for Microelectronics; 20020508-10;》|2002年|P.585-598|共14页
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Wen-li Wu; Eric K. Lin; Christopher L. Soles; Ronald L. Jones; Joseph L. Lenhart; Sushil K. Satija; Dario L. Goldfarb; Marie Angelopoulos; Brian C. Trinque; Sean D. Burns; C. Grant Willson;
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National Institute of Standards and Technology;

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正文语种 eng
中图分类半导体技术;
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The Reaction Front in a Model Photoresist Examined with Neutron and X-ray Reflectivity

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