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Structural Defects in Crystals and Techniques for Their Detection

机译:晶体中的结构缺陷及其检测技术

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The typical structural (growth) defects of crystal are classified according to their macroscopic extension and shortly reviewed. Three methods suitable for the study of defects in large single crystals - etching, optical methods (stress birefringence) and X-ray diffraction topography - are explained. Particular emphasis is laid on X-ray topography in its various techniques. Selected examples of X-ray topographic studies of growth defects such as dislocations (including glide and misfit dislocations), striations, growth-sector and vicinal-sector boundaries in crystal of different compositions and grown by different methods are presented.
机译:晶体的典型结构(生长)缺陷根据其宏观扩展进行分类,并进行了简要回顾。解释了三种适用于研究大型单晶缺陷的方法-蚀刻,光学方法(应力双折射)和X射线衍射形貌。 X射线形貌的各种技术特别受重视。给出了生长缺陷的X射线形貌研究的一些示例,这些缺陷包括不同成分的晶体以及通过不同方法生长的晶体中的位错(包括滑移和失配位错),条纹,生长扇区和邻近扇区的边界。

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