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Al-based aputter-deposited films for large liquid-crystal-display

机译：大型液晶显示器用铝基喷镀膜

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摘要

The relationship between the properties of Al thin film sputter-deposited on large glass substrate (550X650 mm) and the sputtering process parameters were clearly identified by means of Taguchi methods. The number of magnet passes, the substrate temperature, and the Ar pressure have significant effects on the microstructure of Al thin film. Taguchi methods contribute to the optimization of the sputtering process by reducing the number of test trials from 324 to 18. The results indicate good agreement between the properties of the simulated and actual sputter-deposited Al film. direct c 1999 Elsevier Science S.A. All rights reserved.
机译：利用Taguchi方法清楚地确定了在大型玻璃基板（550X650 mm）上溅射沉积的Al薄膜的性能与溅射工艺参数之间的关系。磁体通过的次数，衬底温度和Ar压力对Al薄膜的微观结构有重要影响。 Taguchi方法通过将试验次数从324个减少到18个，从而有助于优化溅射工艺。结果表明，模拟和实际溅射沉积的Al膜的性能之间具有良好的一致性。直接c 1999 Elsevier Science S.A.保留所有权利。

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