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首页> 外文会议>Thin Film Transistors 9 (TFT 9) >Instability behavior of oxide-based top-gate TFTs under electrical and optical stress test
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Instability behavior of oxide-based top-gate TFTs under electrical and optical stress test

机译：氧化物基顶栅TFT在电和光应力测试下的不稳定性行为

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摘要

We report instability behavior of oxide-based top-gate thin-film transistors under electrical and optical stresses. For electrical stress, transfer curve shifts to the right and left for positive and negative gate stress voltages, respectively, while sub-threshold slope (SS) barely changed for both cases. Although this behavior is consistent with the previously reported oxide-based TFT instability behavior explained by charge trapping mechanism, threshold voltage shift seemed to have power-law-time dependency unlike the previous results. We also tested optical stress behavior of the oxide-based TFTs with a blue power-LED. Under prolonged exposure of 3.5mW/cm~2 blue light, both transfer curves under dark and illumination conditions shift to the left, but with significant change in sub-threshold slope for illumination condition. After the electrical and optical stress tests, stress effect was relaxed without any annealing process.
机译：我们报告了在电和光应力下基于氧化物的顶栅薄膜晶体管的不稳定性行为。对于电应力，对于正和负栅极应力电压，传输曲线分别向右和向左移动，而在两种情况下，亚阈值斜率（SS）几乎不变。尽管此行为与先前报道的由电荷俘获机制解释的基于氧化物的TFT不稳定性行为一致，但与先前的结果不同，阈值电压偏移似乎具有幂律时间依赖性。我们还测试了带有蓝色功率LED的基于氧化物的TFT的光应力行为。在长时间暴露于3.5mW / cm〜2的蓝光下，在黑暗和光照条件下，两条传递曲线都向左移动，但在光照条件下，亚阈值斜率发生了显着变化。经过电和光应力测试后，无需任何退火过程即可缓解应力影响。

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  • 来源
    《Thin Film Transistors 9 (TFT 9)》|2008年|115-119|共5页
  • 会议地点 Honolulu HI(US)
  • 作者

    Junhee Cho; Jaewook Jeong; Ho-Nyun Lee; Hong-Gyu Kim; Sung-tae Kim; Yongtaek Hong;

  • 作者单位

    Department of Electrical Engineering and Computer Science, Seoul National University, San 56-1, Shillim-dong, Kwanak-gu, Seoul, 151-742, Korea;

    Department of Electrical Engineering and Computer Science, Seoul National University, San 56-1, Shillim-dong, Kwanak-gu, Seoul, 151-742, Korea;

    Digital Display Research Laboratory, LG Electronics Inc., 16 Woomyeon-dong, Seocho-gu, Seoul 137-724, Korea;

    Digital Display Research Laboratory, LG Electronics Inc., 16 Woomyeon-dong, Seocho-gu, Seoul 137-724, Korea;

    Digital Display Research Laboratory, LG Electronics Inc., 16 Woomyeon-dong, Seocho-gu, Seoul 137-724, Korea;

    Department of Electrical Engineering and Computer Science, Seoul National University, San 56-1, Shillim-dong, Kwanak-gu, Seoul, 151-742, Korea;

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  • 正文语种 eng
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