In situ Preparation of Metal, Metaloxide and Metalnitride Films by Ion Beam Sputtering

机译：离子束溅射原位制备金属，金属氧化物和金属氮化物薄膜

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Studying thin film properties under UHV conditions, the films are more often prepared by evaporation techniques than by sputtering techniques. But films of some materials are not preparable by evaporation techniques. Therefore we have used the arrangement for secondary ion mass spectroscopy (SIMS) to prepare thin films by reactive and non-reactive ion beam sputtering with the aim to get thin films with deposition rates comparable to those for evaporation.

机译：研究超高压条件下的薄膜性能，通常采用蒸发技术而非溅射技术来制备薄膜。但是某些材料的薄膜不能通过蒸发技术制备。因此，我们已采用二次离子质谱（SIMS）的布置，通过反应性和非反应性离子束溅射制备薄膜，目的是获得沉积速率与蒸发速率相当的薄膜。

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来源
《Trends and new applications of thin films》|1998年|493-496|共4页
会议地点 Regensburg(DE);Regensburg(DE)
作者
H. Hammer; H. Busse; R. Kiefer;
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作者单位

Institut fuer Angewandte Physik, Heinrich-Heine-Universitaet Duesseldorf, Universitaetsstrasse 1, D-40225 Duesseldorf, Germany;

Institut fuer Angewandte Physik, Heinrich-Heine-Universitaet Duesseldorf, Universitaetsstrasse 1, D-40225 Duesseldorf, Germany;

Institut fuer Angewandte Physik, Heinrich-Heine-Universitaet Duesseldorf, Universitaetsstrasse 1, D-40225 Duesseldorf, Germany;

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原文格式 PDF
正文语种 eng
中图分类薄膜物理学;
关键词
ion beam sputtering; reactive sputtering; auger-electron spectroscopy (AES); secondary ion mass spectroscopy (SIMS);

机译：离子束溅射反应溅射俄歇电子能谱（AES）;二次离子质谱（SIMS）;

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专利

1. In situ preparation of Y/sub 1/Ba/sub 2/Cu/sub 3/O/sub 7-x/ thin films deposited by ion beam sputtering: preliminary results [J] . Barbanera S., Murtas F. IEEE Transactions on Magnetics . 1991,第2期

机译：离子束溅射沉积Y / sub 1 / Ba / sub 2 / Cu / sub 3 / O / sub 7-x /薄膜的原位制备：初步结果
2. Effects of sputtering and assisting ions on the orientation of titanium nitride films fabricated by ion beam assisted sputtering deposition from metal target [J] . Zhang Linao, Tong Shuo, Liu Haonan, Materials Letters . 2016,第may15期

机译：溅射和辅助离子对离子束辅助溅射沉积金属靶制备氮化钛膜取向的影响
3. Ion beam analysis and co-sputtering simulation (CO-SS) of bi-metal films produced by magnetron co-sputtering [J] . J. Cruz, E. Andrade, S. Muhl, Nuclear Instruments & Methods in Physics Research. B, Beam Interactions with Materials and Atoms . 2016,第Mara15期

机译：磁控共溅射双金属膜的离子束分析和共溅射模拟（CO-SS）
4. In situ Preparation of Metal, Metaloxide and Metalnitride Films by Ion Beam Sputtering [C] . International symposium on trends and new applications of thin films;TATF '98 . 1998

机译：原位制备金属，金属氧化物和金属氮化物膜通过离子束溅射
5. Preparation, characterization and post-deposition modification of pulsed-dc magnetron sputtered Vanadium Oxide thin films for microbolometer applications [D] . Venkatasubramanian, Chandrasekaran 2010

机译：用于微辐射热计应用的脉冲直流磁控溅射氧化钒薄膜的制备，表征和沉积后修饰
6. Metal–Insulator Transition of Ultrathin Sputtered Metals on Phenolic Resin Thin Films: Growth Morphology and Relations to Surface Free Energy and Reactivity [O] . Christian Schuster, Harald Rennhofer, Heinz Amenitsch, 2021

机译：超薄溅射金属对酚醛树脂薄膜的金属绝缘体转变：生长形态与表面自由能和反应性的关系
7. Preparation of metal doped SiO₂ films by magnetron sputtering deposition using metal oxide mixture powder target [O] . H. Kawasaki, T. Ohshima, Y. Yagyu, 2018

机译：使用金属氧化物混合物粉末靶通过磁控溅射沉积制备金属掺杂SiO <亚> 2 膜
8. Preparation of Sn-Doped In2O3 (ITO) Films at Low Deposition Temperatures by Ion-Beam Sputtering. [R] . Fan, J. C. C. 1978

机译：离子束溅射制备低掺杂sn掺杂In2O3（ITO）薄膜。

In situ Preparation of Metal, Metaloxide and Metalnitride Films by Ion Beam Sputtering

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