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Bottom-up surface self-assembly of polymer colloids to form patterned arrays.

机译：自下而上的聚合物胶体表面自组装形成图案阵列。

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摘要

Self-assembled particle arrays have received a significant amount of attention recently because of their interesting optical properties. In contrast to top-down self-assembly approaches, in which a pattern is imposed upon the system by such processes as microcontact printing or photolithography, bottom-up self-assembly relies upon the system to both define the pattern and assemble the individual elements. In this latter approach, fundamental parameters such as electrostatic and van der Waals interactions, as well as capillary forces are tuned to achieve the desired pattern. Two bottom-up particle self-assembly processes are discussed.; The first process involves drying a droplet containing a suspension of positively charged polymer particles on a flat negatively charged hydrophilic surface. This extremely simple method produces lines of polymer colloids with regular 1.5-4.5-pmum line spacings and smaller than 2-4m linewidths over a broad surface area. The resulting patterns are at least an order of magnitude smaller in both linewidth and line spacing than similar approaches reported in the literature and follows a completely different mechanism. The second process involves the manipulation of polymer particle films trapped at an air-water interface. This modified Langmuir-Blodgett approach produces two-dimensional arrays of particles with hexagonal symmetry and tunable lattice constants. The key distinguishing feature in the present work is the ability to transfer patterned sub-monolayer interfacial particle films to a solid substrate. This transfer was achieved by tailoring the chemical functionality of the substrate surface to that of the polymer particle surface in order to promote rapid and strong adhesion with each individual particle when the substrate is brought into contact with the interfacial particle film. By controlling the transfer geometry, the resulting pattern after deposition onto the substrate may be identical to that observed at the interface or, if desired, may be altered to produce a symmetry other than hexagonal. After assembling a patterned particle array, secondary processes, such as nanoparticle adsorption or substrate etching, may then be performed to increase the functionality and potential usefulness of the self-assembled system.
机译：自组装粒子阵列由于其令人感兴趣的光学特性，最近受到了广泛的关注。与自上而下的自组装方法（其中通过诸如微接触印刷或光刻的方法将图案施加到系统上）相反，自下而上的自组装方法依赖于系统来定义图案并组装各个元件。在后一种方法中，调整基本参数（例如静电和范德华相互作用）以及毛细作用力以实现所需的模式。讨论了两个自下而上的粒子自组装过程。第一个过程涉及干燥在平坦的带负电荷的亲水性表面上包含带正电荷的聚合物颗粒悬浮液的液滴。这种极其简单的方法可在宽表面积上产生规则的1.5-4.5-pmum线间距和小于2-4m线宽的聚合物胶体线。与文献中报道的类似方法相比，所得图案的线宽和线间距都至少小一个数量级，并且遵循完全不同的机制。第二种方法涉及处理截留在空气-水界面的聚合物颗粒薄膜。这种改进的Langmuir-Blodgett方法产生具有六边形对称性和可调晶格常数的二维粒子阵列。本工作的主要区别特征是能够将图案化的亚单层界面颗粒膜转移到固体基质上。通过使基材表面的化学官能度适应于聚合物颗粒表面的化学官能度，以在基材与界面颗粒膜接触时促进与每个单个颗粒的快速而牢固的粘合来实现转移。通过控制转移几何形状，在沉积到基板上之后得到的图案可以与在界面处观察到的图案相同，或者，如果需要，可以改变图案以产生除六边形之外的对称性。在组装图案化的颗粒阵列之后，然后可以执行诸如纳米颗粒吸附或基板蚀刻的次级工艺以增加自组装系统的功能性和潜在的实用性。

著录项

  • 作者

    Ray, Matthew Alan.;

  • 作者单位

    Lehigh University.;

  • 授予单位 Lehigh University.;
  • 学科 Chemistry Polymer.; Engineering Materials Science.
  • 学位 Ph.D.
  • 年度 2006
  • 页码 301 p.
  • 总页数 301
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 高分子化学（高聚物）;工程材料学;
  • 关键词

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