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Experimental study of microwave assisted CVD growth of carbon nanotubes on silicon wafer using cobalt as a catalyst.

机译：以钴为催化剂的微波辅助在硅片上CVD生长碳纳米管的实验研究。

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Controlled growth of carbon nanotubes is an important step in the realization of practical nanoscale devices for applications in nanoelectronics, sensors, field emission displays, and microelectro mechanical systems (MEMS), among others. Microwave assisted Chemical Vapor Deposition (CVD) technique has been successfully used to synthesize carbon nanotubes on silicon wafer substrates. Since a transition metal catalyst, such as iron, nickel, cobalt is needed for growth of nanotubes, a thin film of cobalt catalyst (2∼5 nm) is deposited on the silicon wafer substrates using Pulsed Laser Deposition (PLD) technique using an excimer laser (248nm). The CVD process conditions, including growth time, plasma pretreatment time, process gases, and flow rate of carbon source gas (methane) are studied towards obtaining controlled growth of nanotubes. Further, patterned catalyst film is formed by the PLD technique and vertically aligned nanotubes are successfully grown on patterned catalyst film. The carbon nanotubes are characterized using SEM, TEM, AFM and mu-Raman Spectroscopy.

机译：碳纳米管的受控生长是实现用于纳米电子，传感器，场发射显示器和微机电系统（MEMS）等的实用纳米级设备的重要一步。微波辅助化学气相沉积（CVD）技术已成功用于在硅片基板上合成碳纳米管。由于纳米管的生长需要诸如铁，镍，钴之类的过渡金属催化剂，因此使用受激准分子通过脉冲激光沉积（PLD）技术将钴催化剂薄膜（2-5 nm）沉积在硅晶片基板上。激光（248nm）。为了获得受控的纳米管生长，研究了CVD工艺条件，包括生长时间，等离子体预处理时间，工艺气体和碳源气体（甲烷）的流速。此外，通过PLD技术形成图案化的催化剂膜，并且在图案化的催化剂膜上成功地生长了垂直取向的纳米管。使用SEM，TEM，AFM和μ拉曼光谱法对碳纳米管进行表征。

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作者
Ramakrishnan, Madhan Prasath.;
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作者单位

Oklahoma State University.;

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授予单位 Oklahoma State University.;
学科 Engineering Mechanical.
学位 M.S.
年度 2005
页码 137 p.
总页数 137
原文格式 PDF
正文语种 eng
中图分类机械、仪表工业;
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1. Laser-assisted synthesis of cobalt@N-doped carbon nanotubes decorated channels and pillars of wafer-sized silicon as highly efficient three-dimensional solar evaporator [J] . Yiwei Zhao, Haifeng Yuan, Xiaofei Zhang, 中国化学快报（英文版） . 2021,第010期

机译：激光辅助合成钴@ n掺杂的碳纳米管装饰通道和晶片尺寸硅支柱，如高效的三维太阳能蒸发器
2. A study of the effect of different catalysts for the efficient CVD growth of carbon nanotubes on silicon substrates [J] . Ansaldo A, Haluska M, Cech J, Physica, E. Low-dimensional systems & nanostructures . 2007,第1a2期

机译：不同催化剂对硅衬底上碳纳米管高效CVD生长的影响的研究
3. Experimental study of a pulsed microwave plasma assisted chemical vapour deposition of carbon nanotubes [J] . M. Belmahi, L. Le Brizoual, M. B. Assouar, Physica Status Solidi. A, Applications and Materials Science . 2005,第11期

机译：脉冲微波等离子体辅助碳纳米管化学气相沉积的实验研究
4. Preliminary experimental results of the hierarchical growth of carbon nanotubes on recovered carbon fibers by CCVD method [C] . C. Borriello, S. Portofino, P. Iovane, International Conference on "Times of Polymers and Composites" . 2018

机译：CCVD法通过碳纳米管碳纳米管分层生长的初步实验结果
5. Synthesis of carbon nanotubes by microwave plasma enhanced CVD on silicon using iron as catalyst. [D] . Nidadavolu, Anandha G. R. 2005

机译：以铁为催化剂，在硅上通过微波等离子体增强CVD合成碳纳米管。
6. Excellent Field Emission Properties of Short Conical Carbon Nanotubes Prepared by Microwave Plasma Enhanced CVD Process [O] . SanjayKumar Srivastava, Vasant D Vankar, Vikram Kumar 2008

机译：微波等离子体增强CVD工艺制备的短圆锥形碳纳米管的优异场发射性能
7. Direct Preparation and Patterning of Iron Oxide Nanoparticles via Microcontact Printing on Silicon Wafers for the Growth of Single-Walled Carbon Nanotubes [O] . -1

机译：通过微观印刷在硅晶片上进行氧化铁纳米粒子的直接制备和图案化用于单壁碳纳米管的生长
8. Comparative Study of Three Different Chemical Vapor Deposition (CVD) Techniques of Carbon Nanotube Growth on Diamond Films. [R] . B. Tsao B. T. Quinton C. V. Varanasi J. Burke P. N. Barnes 2013

机译：金刚石薄膜上碳纳米管生长的三种不同化学气相沉积（CVD）技术的比较研究。

Experimental study of microwave assisted CVD growth of carbon nanotubes on silicon wafer using cobalt as a catalyst.

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