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Investigation of Ion and Electron Energy Distributions in Radio Frequency and Mid-frequency plasmas in Magnetron Systems.

机译：研究磁控管系统中射频和中频等离子体中的离子和电子能量分布。

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摘要

The plasma parameters and ion energy distributions of dominant species in Radio Frequency and mid-Frequency magnetrons have been investigated with the Langmuir probe and Electrostatic Quadrupole Plasma mass spectrometer for argon, hydrogen and oxygen gas mixtures and presented as functions of gas flow rate, applied input power, gas pressure, and distance of the probes from the target electrodes. The distributions of the species measured in the mid-frequency discharge exhibit features which were a result of symmetric and asymmetric collisions between ionic and neutral species as well as high energy electron collisions in the sheath region. The distributions of the heavy species measured in the rf discharge exhibited no secondary features and were peaked at the plasma potential, which was a result of collisions in the bulk of the discharge. The distributions of H+, H 2 + and H3+ species exhibited bimodal peaks, which was indicative of ohmic and stochastic heating as commonly reported.;Fluxes of dominant ions were estimated from the ion energy distribution functions and compared to the deposition rates of hydrogenated amorphous silicon and aluminum oxide thin films. Correlations between the flux and mean energies of the species to the deposition rates of the thin films were investigated. Results of the rf discharge was indicative that the deposition rate of silicon could not be predicted from the fluxes or the mean energies of the species. Correlation between the Ar+ and Al+ ion fluxes and the deposition rate of aluminum oxide was realized. The characterization of the thin films grown in the mid-frequency discharge together with the ion energy distributions showed that pure gamma phased aluminum oxide were observed when the targets were poisoned. Furthermore, the ion energy distribution of Arm ions underwent a transition from a bimodal peak to a single peak as the target was poisoned from metallic mode to the poison mode.;The comprehensive study of the rf- and mid- frequency magnetron chambers demonstrated that the diagnostic techniques used to characterize discharges in conventional system are applicable to the discharges in the mid-frequency magnetron chamber.
机译：用Langmuir探针和静电四极等离子体质谱仪对氩气，氢气和氧气混合物进行了研究，研究了射频和中频磁控管中主要物质的等离子体参数和离子能量分布，并表示为气体流量，应用输入的函数功率，气压以及探针与目标电极的距离。在中频放电中测得的物质分布表现出特征，这是离子和中性物质之间对称和非对称碰撞以及鞘区中高能电子碰撞的结果。在rf放电中测得的重金属的分布没有次级特征，在等离子电势处达到峰值，这是放电中大部分碰撞的结果。 H +，H 2+和H3 +物种的分布表现出双峰峰，这通常表明是欧姆加热和随机加热。;根据离子能量分布函数估算了优势离子的通量，并将其与氢化非晶硅的沉积速率进行了比较。和氧化铝薄膜。研究了物质的通量和平均能量与薄膜沉积速率之间的关系。射频放电的结果表明无法通过物质的通量或平均能量预测硅的沉积速率。实现了Ar +和Al +离子通量与氧化铝沉积速率之间的相关性。中频放电中生长的薄膜的特征以及离子能量分布表明，当靶中毒时，可以观察到纯γ相氧化铝。此外，当目标从金属模式毒化为毒药模式时，Arm离子的离子能量分布经历了从双峰到单峰的转变。射频和中频磁控管腔的综合研究表明，在常规系统中用于表征放电的诊断技术适用于中频磁控管腔中的放电。

著录项

  • 作者

    Mensah, Samuel Lartey.;

  • 作者单位

    University of Arkansas.;

  • 授予单位 University of Arkansas.;
  • 学科 Engineering Electronics and Electrical.;Engineering Materials Science.;Engineering Mechanical.
  • 学位 Ph.D.
  • 年度 2011
  • 页码 320 p.
  • 总页数 320
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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