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Characterization of high power impulse magnetron sputtering discharges.

机译：大功率脉冲磁控管溅射放电的表征。

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Paper I: In the first paper, we present a new approach in the characterization of the high power pulsed magnetron sputtering (HiPIMS) discharge evolution---time- and species-resolved plasma imaging---employing a set of band-pass optical interference filters suitable for the isolation of the emission originating from different species populating the plasma. We demonstrate that the introduction of such filters can be used to distinguish different phases of the discharge, and to visualize numerous plasma effects including background gas excitations during the discharge ignition, gas shock waves, and expansion of metal-rich plasmas. In particular, the application of this technique is shown on the diagnostics of the 200 micros long non-reactive HiPIMS discharges using a Cr target.;Paper II: In order to gain further information about the dynamics of reactive HiPIMS discharges, both fast plasma imaging and time- and space-resolved optical emission spectroscopy (OES) are used for a systematic investigation of the 200 micros long HiPIMS pulses operated in Ar, N2 and N 2/Ar mixtures and at various pressures. It is observed that the dense metal plasma created next to the target propagates in the reactor at a speed ranging from 0.7 to 3.5 km s-1, depending on the working gas composition and the pressure. In fact, it increases with higher N 2 concentration and with lower pressure. The visible form of the propagating plasma wave changes from a hemispherical shape in Ar to a drop-like shape extending far from the target with increasing N2 concentration, owing to the significant emission from molecular N2. Interestingly, the evidence of the target self-sputtering is found for all investigated conditions, including pure N2 atmosphere.;Paper III: Here, we report on the time- and species-resolved plasma imaging analysis of the dynamics of the 200 micros long HiPIMS discharges above a Cr target ignited in pure O2. It is shown that the discharge emission is dominated solely by neutral and ionized oxygen, since the monitored discharge is operated above a fully poisoned (oxidized) target from which only a minimum of Cr is sputtered. No signs of self-sputtering have been detected, in contrast to the discharges in Ar, N2 and N2/Ar mixtures previously investigated.;Paper IV: In the fourth paper, we study different power management approaches in HiPIMS and MPPMS and their effects on the pulsed discharge evolution, plasma composition, and metal ionization estimated by OES. It is shown that HiPIMS is the only technique that enables the discharge operation in self-sputtering mode within the investigated range of applied powers, resulting in a significantly higher ionization of the sputtered metal than that reached with MPPMS. In contrast to HiPIMS, MPPMS provides a higher versatility in adjusting the pulse shape and pulse length. This feature can be particularly beneficial, for instance, in the discharge ignition. Nb coatings prepared by HiPIMS and MPPMS have very similar deposition rates that are lower than in DCMS. All films prepared at p = 1Pa possess a dense columnar structure. Coatings deposited by the two high power pulsed discharges exhibit higher compressive stress and larger out-of-plane lattice spacing than those prepared by DC sputtering under comparable conditions. At higher pressure, p = 2Pa, DCMS-grown films show a tensile stress due to a porous microstructure, while films prepared by HiPIMS and MPPMS are dense and in compression, most probably due to the substantial ion bombardment.;Paper V: In the last paper, we analyze the behavior of the HiPIMS, MPPMS and DCMS discharges in reactive O2/Ar gas mixtures and evaluate the characteristics of the fabricated NbOx films. We demonstrate that the surface metal oxides can be effectively sputter-eroded from the target during both HiPIMS and MPPMS pulses, and that sputtering from a partially oxide-free target is possible even at high oxygen concentrations. This results in a hysteresisfree deposition process which allows one to prepare optically transparent b2O5 coatings at a high growth rate without the need of feedback control commonly used in reactive DCMS. Nb2O 5 coatings prepared by both reactive high power pulsed discharges exhibited a high index of refraction, a low extinction coefficient, a near-zero internal stress, and high hardness and Young's modulus. The HiPIMS-deposited coatings showed the highest deposition rate and the highest index of refraction. The latter observation was related to the higher film density. In comparison, MPPMS exhibited the highest power-normalized deposition rate among the three investigated deposition techniques, possibly due to the longer period that is available for the gradual target cleaning. (Abstract shortened by UMI.).
机译：论文I：在第一篇论文中，我们提出了一种表征高功率脉冲磁控溅射（HiPIMS）放电演化的新方法-时间分辨和物种分辨等离子体成像-采用一组带通光学干涉滤光片适用于隔离源自等离子体中不同物种的发射。我们证明，这种过滤器的引入可用于区分放电的不同阶段，并可视化许多等离子体效应，包括在放电点火，气体冲击波和富金属等离子体膨胀过程中的背景气体激发。特别是，在使用Cr靶对200微米长的非反应性HiPIMS放电进行诊断时，显示了该技术的应用。论文二：为了获得有关反应性HiPIMS放电动力学的更多信息，两种快速等离子体成像时空分辨发射光谱法（OES）用于对Ar，N2和N 2 / Ar混合物中不同压力下工作的200微米长的HiPIMS脉冲进行系统研究。可以观察到，取决于工作气体的成分和压力，在靶附近产生的致密金属等离子体在反应器中的传播速度为0.7至3.5 km s -1。实际上，它随着较高的N 2浓度和较低的压力而增加。由于分子N2的大量发射，传播的等离子体波的可见形式从Ar中的半球形变为滴状，随着N2浓度的增加而远离靶标。有趣的是，在所有被调查的条件下，包括纯氮气环境下，都发现了目标自溅射的证据。论文三：在这里，我们报告了时间和物种分辨的等离子体成像分析了200微米长的HiPIMS的动力学。放电超过在纯O2中点燃的Cr目标。可以看出，放电放电仅由中性和离子化的氧气控制，这是因为所监测的放电在完全中毒（氧化）的靶材上方进行操作，从靶材中仅溅射出最少的Cr。与先前研究的Ar，N2和N2 / Ar混合物中的放电相比，没有检测到自溅射迹象。论文四：在第四篇论文中，我们研究了HiPIMS和MPPMS中不同的功率管理方法及其对功率的影响由OES估算的脉冲放电演变，等离子体组成和金属电离。结果表明，HiPIMS是唯一能够在所研究的施加功率范围内以自溅射模式进行放电操作的技术，其结果是使溅射金属的电离度明显高于MPPMS。与HiPIMS相比，MPPMS在调节脉冲形状和脉冲长度方面具有更高的通用性。该特征例如在放电点火中可能是特别有益的。由HiPIMS和MPPMS制备的Nb涂层的沉积速率非常相似，低于DCMS。在p = 1Pa时制备的所有薄膜均具有致密的柱状结构。与在相当条件下通过直流溅射制备的涂层相比，由两次高功率脉冲放电沉积的涂层表现出更高的压应力和更大的面外晶格间距。在较高压力下，p = 2Pa，DCMS生长的薄膜由于具有多孔微结构而显示出张应力，而由HiPIMS和MPPMS制备的薄膜致密且处于压缩状态，很可能是由于大量的离子轰击所致;最后，我们分析了反应性O2 / Ar气体混合物中HiPIMS，MPPMS和DCMS放电的行为，并评估了制备的NbOx膜的特性。我们证明，在HiPIMS和MPPMS脉冲期间，可以有效地从目标表面溅射金属氧化物，即使在高氧浓度下也可以从部分无氧化物的目标溅射。这导致了无磁滞沉积工艺，该工艺可以以高生长速率制备光学透明的b2O5涂层，而无需通常用于反应性DCMS的反馈控制。通过两种反应性高功率脉冲放电制备的Nb2O 5涂层均具有高折射率，低消光系数，接近零的内应力以及高硬度和杨氏模量。 HiPIMS沉积的涂层显示出最高的沉积速率和最高的折射率。后者的观察结果与较高的膜密度有关。相比之下，MPPMS在三种研究的沉积技术中表现出最高的功率归一化沉积速率，这可能是由于可用于逐步目标清洁的周期更长。 （摘要由UMI缩短。）。

著录项

  • 作者

    Hala, Matej.;

  • 作者单位

    Ecole Polytechnique, Montreal (Canada).;

  • 授予单位 Ecole Polytechnique, Montreal (Canada).;
  • 学科 Engineering Materials Science.;Engineering Electronics and Electrical.
  • 学位 Ph.D.
  • 年度 2011
  • 页码 235 p.
  • 总页数 235
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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