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Comparing the roles of inductive and capacitive coupling in a planar inductively coupled plasma through both theory and experiment.

机译：通过理论和实验比较了电感耦合和电容耦合在平面电感耦合等离子体中的作用。

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The inductive and capacitive excitation coil-plasma interaction in an inductively coupled plasma (ICP) is studied in this dissertation. The inductive coupling transfers power from the excitation coil to the plasma, while the parasitic capacitive coupling gives rise to rf plasma potential and DC self bias on the dielectric window, which causes unwanted dielectric window sputtering. A combined inductive/capacitive model was developed in order to quantify this problem.; Prior to this work, Piejak et al. developed an air core transformer model to describe the power transfer mechanism from the excitation coil to the plasma through an inductive coupling mechanism, in which the plasma is considered the secondary circuit of an air core transformer. The plasma secondary circuit is coupled to the primary circuit through a magnetic coupling coefficient k. The inductive coupling model concludes that the power consumed in the plasma is proportional to k2 for a given rf current applied to the excitation coil. This is verified experimentally herein to determine the effectiveness of the inductive coupling model.; The high rf voltage applied to drive the excitation coil creates a parasitic capacitive current pathway through the dielectric window and rf sheath to the plasma. A voltage divider circuit model is developed herein to understand the capacitive coupling from the excitation coil to the plasma, where the dielectric window and the rf sheath are considered as series capacitances. The capacitive coupling model is experimentally verified from measurements of the rf plasma potential.; From both inductive and capacitive coupling models, it is shown that the rf plasma potential is indirectly influenced by inductive coupling as well as directly by capacitive coupling. Finally, a combined inductive/capacitive model is developed in order to describe fully the combined effects of the two coupling mechanisms from the excitation coil to the plasma. The combined model gives a simple relationship between the coupling and the resulting rf plasma potential variation. This combined model enables one to understand the excitation coil-plasma interaction and characterize the electrical parameters in the plasma system.
机译：本文研究了电感耦合等离子体（ICP）中电感线圈和电容线圈的相互作用。电感耦合将功率从激励线圈传输到等离子体，而寄生电容耦合在介电窗上产生rf等离子体电势和DC自偏压，这会导致不必要的介电窗溅射。为了量化这个问题，开发了组合的电感/电容模型。在进行这项工作之前，Piedakk等人。他开发了一种空芯变压器模型，以描述通过励磁耦合机制从励磁线圈到等离子体的功率传输机制，其中等离子体被认为是空芯变压器的次级电路。等离子体次级电路通过磁耦合系数k耦合到初级电路。电感耦合模型得出的结论是，对于施加到励磁线圈的给定rf电流，等离子体中消耗的功率与k 2 成比例。在此通过实验进行验证，以确定电感耦合模型的有效性。施加以驱动激励线圈的高射频电压会产生一条寄生电容电流路径，该电流通过电介质窗口和射频护套到达等离子体。本文中开发了一个分压器电路模型，以了解从激励线圈到等离子体的电容耦合，其中电介质窗口和射频鞘被视为串联电容。电容耦合模型通过对射频等离子体电势的测量进行了实验验证。从电感耦合模型和电容耦合模型都可以看出，射频等离子体电势既受电感耦合间接影响，也受电容耦合直接影响。最后，开发了一个组合的电感/电容模型，以便完整描述从激励线圈到等离子体的两种耦合机制的组合效果。组合模型给出了耦合与所产生的射频等离子体电势变化之间的简单关系。这种组合模型使人们能够理解激励线圈与等离子体之间的相互作用，并表征等离子体系统中的电参数。

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