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Chemical vapor deposition and characterization of poly(p-phenylene vinylene) films.

机译：聚对苯撑亚乙烯基薄膜的化学气相沉积和表征。

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摘要

As a conducting, electroluminescent, and photoluminescent polymer, poly(p-phenylene vinylene) (PPV) is a material of much interest for electronic and optical applications. Although this polymer has traditionally been deposited using spin-on methods and soluble precursor polymers, the technique has several drawbacks including an increase in contamination and defects from the solvent, the need to convert the precursor into PPV without adding further impurities or damaging the film, and the processing restrictions when dealing with liquid depositions. Chemical vapor deposition (CVD), on the other hand, deposits the precursor polymer in the gas phase and therefore eliminates the need for a solvent and creates the capability for conformal deposition on many types of nanostructured substrates. However, PPV films deposited by CVD remain understudied. This work aims to investigate properties of those films including the removal of bromine left from the CVD precursor, the behavior and structure of PPV after heat treatment at elevated temperatures (>450°C), the usefulness of encapsulation materials for preventing photodegradation, and characteristics of films deposited on top of nanosize porous materials.;Bromine from the precursor polymer is removed during the first thirty minutes of heating. Films annealed at 300°C in nitrogen gas consisted of 0.36% bromine; however, photoluminescence spectra comparing films annealed at 150 and 300°C showed more defects in the 300°C film. Heat treatment of PPV beyond the initial anneal showed that the film degrades at 500°C by emitting monomer fragments without crosslinking.;Photodegradation of PPV films due to incorporation of oxygen during light exposure can be reduced from 80% to 30% under UV light and nearly prevented under blue light when encapsulated with 10 nm aluminum oxide. Encapsulation with organic Parylene shows no significant improvement.;Use of the Stern-Volmer equation to examine self-quenching in films shows larger conformational change and increased restriction from change in electron density due to electron transition during excitation in bulk polymer films over 60 nm thick. PPV deposited into porous (∼4 nm in diameter) nanostructured substrate shows a larger 0-0 than 0-1 transition peak intensity and decreased disorder in the films due to structure imposed by substrate matrix.
机译：作为导电的，电致发光的和光致发光的聚合物，聚（对亚苯基亚乙烯基）（PPV）是电子和光学应用中备受关注的材料。尽管传统上已使用旋涂法和可溶性前体聚合物沉积了该聚合物，但该技术仍存在一些缺点，包括污染的增加和​​来自溶剂的缺陷，需要将前体转化为PPV而又不添加其他杂质或损坏膜，以及处理液体沉积时的处理限制。另一方面，化学气相沉积（CVD）在气相中沉积前体聚合物，因此消除了对溶剂的需求，并在多种类型的纳米结构化基材上形成了保形沉积的能力。然而，通过CVD沉积的PPV膜仍未被充分研究。这项工作旨在研究这些膜的性能，包括去除CVD前体中残留的溴，高温（> 450°C）下热处理后PPV的行为和结构，用于防止光降解的封装材料的有用性以及特性。在加热的前三十分钟期间，从前体聚合物中除去了溴。在氮气中于300°C退火的膜由0.36％的溴组成；然而，比较在150和300°C退火的薄膜的光致发光光谱显示300°C薄膜中的缺陷更多。 PPV的热处理超过初始退火温度，表明该膜在500°C时会通过释放单体片段而未发生交联而降解。;在紫外线照射下，由于曝光过程中掺入氧气，PPV膜的光降解可从80％降低至30％。当用10 nm氧化铝封装时，在蓝光下几乎可以防止。有机聚对二甲苯的包封没有显着改善。;使用Stern-Volmer方程检查膜中的自猝灭显示更大的构象变化，并且由于厚度超过60 nm的大块聚合物膜在激发过程中的电子跃迁而增加了电子密度变化的限制。 。沉积到多孔（直径约4 nm）纳米结构化基材中的PPV表现出比0-1过渡峰强度大的0-0和由于基材基质施加的结构而降低了薄膜的无序性。

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  • 作者

    Gedelilan, Cynthia Ann.;

  • 作者单位

    Rensselaer Polytechnic Institute.;

  • 授予单位 Rensselaer Polytechnic Institute.;
  • 学科 Physics Condensed Matter.;Engineering Materials Science.
  • 学位 Ph.D.
  • 年度 2008
  • 页码 116 p.
  • 总页数 116
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料学;
  • 关键词

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