首页> 中文期刊> 《化学学报》 >光敏感遥爪聚合物C-PDMAEMA的合成及其性能研究

光敏感遥爪聚合物C-PDMAEMA的合成及其性能研究

         

摘要

A novel photo-sensitive telechelic poly(N,N-dimethylaminoethyl methacrylate) with coumarin end(C-PDMAEMA) was prepared with DAMEMA as monomer,coumarin-containing disulfide(C-S-S-C) as a chain transfer agent in the presence of Bu3P and water,AIBN as initiator.The polymer was characterized with 1H NMR,GPC and FTIR spectroscopes.It was found that the polymer can immediately form polymer nano-aggregate in aqueous solution.And the coumarin end group of the polymer can be reversibly photo-dimerized upon 365 and 254 nm irradiation.The hydrodynamic size analysis determined by Malvern Zetasizer Nano-ZS instrument and the TEM observations showed that the average size of the polymer nano-aggregate increased upon 365 nm irradition and decreased upon the subsequent 254 nm light.%以香豆素二硫化物(C-S-S-C)/三丁基膦复合体系为链转移剂、甲基丙烯酸-N,N-二甲氨基乙酯(DMAEMA)为单体、偶氮二异丁腈(AIBN)为引发剂制备了末端为香豆素光响应基元的双亲性遥爪聚合物(C-PDMAEMA).用FTIR,GPC,1H NMR等对该聚合物进行了结构表征.研究表明该遥爪聚合物可直接在水中形成纳米聚集体;且其香豆素端基可在365和254 nm交替光照下进行可逆光二聚反应.同时纳米粒度跟踪(Malvern Zetasizer Nano-ZS)、透射电镜(TEM)跟踪结果表明,随香豆素端基光二聚反应的进行,聚合物纳米聚集体的粒径逐渐增大;反之,随着光解二聚反应的进行,该纳米聚集体的粒径逐渐减小.

著录项

相似文献

  • 中文文献
  • 外文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号