通过改变Si掺杂量制备出了具有显著铁电和反铁电特征的HfO2纳米薄膜，对其电滞回线、电容-电压和漏电流-电压特性以及物相温度稳定性进行了对比研究。反铁电薄膜的介电系数大于铁电薄膜，在电场加载和减载过程中发生的可逆反铁电-铁电相变导致了双电滞回线的出现，在室温至185◦C的测试温度范围内未出现反铁电→顺电相变。在电流-电压特性测量时观察到的负微分电阻效应归因于极化弛豫等慢响应机理的贡献。%Ferroelectric and antiferroelectric HfO2 nano-films were prepared by changing silicon doping concentration, and their basic properties were compared in terms of polarization hysteresis, capacitance-voltage and leakage-voltage behavior, as well as the effect of temperature on phase stability. Antiferroelectric thin film exhibits a higher dielectric constant than the ferroelectric film, and is characterized by the double polarization hysteresis loops due to reversible antiferroelectric-ferroelectric phase transition induced during loading and unloading processes of electric field. No antiferroelectric-paraelectric phase transition is observed at measuring temperatures up to 185 ◦C. The negative differential resistivity effect observed in leakage measurements is attributed to the contributions from slow response mechanisms like polarization relaxation.
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